陈弘, 禤. 戴. 贾. (2014). Fabrication of large-area nano-scale patterned sapphire substrate with laser interference lithography. Optoelectronics letters, 10(1), 51-54. https://doi.org/10.1007/s11801-014-3188-6
Chicago Style (17th ed.) Citation陈弘, 禤铭东 戴隆贵 贾海强. "Fabrication of Large-area Nano-scale Patterned Sapphire Substrate with Laser Interference Lithography." Optoelectronics Letters 10, no. 1 (2014): 51-54. https://doi.org/10.1007/s11801-014-3188-6.
MLA (9th ed.) Citation陈弘, 禤铭东 戴隆贵 贾海强. "Fabrication of Large-area Nano-scale Patterned Sapphire Substrate with Laser Interference Lithography." Optoelectronics Letters, vol. 10, no. 1, 2014, pp. 51-54, https://doi.org/10.1007/s11801-014-3188-6.
Warning: These citations may not always be 100% accurate.