Study of the dose rate effect of 180 nm nMOSFETs

Radiation induced offstate leakage in the shallow trench isolation regions of SIMC 0.18 μm nMOSFETs is studied as a function of dose rate. A "true" dose rate effect (TDRE) is observed. Increased damage is observed at low dose rate (LDR) than at high dose rate (HDR) when annealing is taken into accou...

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Published inChinese physics C Vol. 39; no. 1; pp. 65 - 69
Main Author 何宝平 姚志斌 盛江坤 王祖军 黄绍燕 刘敏波 肖志刚
Format Journal Article
LanguageEnglish
Published 2015
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ISSN1674-1137
0254-3052
DOI10.1088/1674-1137/39/1/016004

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Summary:Radiation induced offstate leakage in the shallow trench isolation regions of SIMC 0.18 μm nMOSFETs is studied as a function of dose rate. A "true" dose rate effect (TDRE) is observed. Increased damage is observed at low dose rate (LDR) than at high dose rate (HDR) when annealing is taken into account. A new method of simulating radiation induced degradation in shallow trench isolation (STI) is presented. A comparison of radiation induced offstate leakage current in test nMOSFETs between total dose irradiation experiments and simulation results exhibits excellent agreement. The investigation results imply that the enhancement of the leakage current may be worse for the dose rate encountered in the environment of space.
Bibliography:Radiation induced offstate leakage in the shallow trench isolation regions of SIMC 0.18 μm nMOSFETs is studied as a function of dose rate. A "true" dose rate effect (TDRE) is observed. Increased damage is observed at low dose rate (LDR) than at high dose rate (HDR) when annealing is taken into account. A new method of simulating radiation induced degradation in shallow trench isolation (STI) is presented. A comparison of radiation induced offstate leakage current in test nMOSFETs between total dose irradiation experiments and simulation results exhibits excellent agreement. The investigation results imply that the enhancement of the leakage current may be worse for the dose rate encountered in the environment of space.
11-5641/O4
HE Bao-Ping, YAO Zhi-Bin,SHENG Jiang-Kun,WANG Zu-Jun, HUANG Shao-Yan, LIU Min-Bo, XIAO Zhi-Gang( The State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology Shanxi Xi'an 710613, China)
dose rate effect, MOSFET, ELDRS, total dose
ObjectType-Article-1
SourceType-Scholarly Journals-1
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content type line 23
ISSN:1674-1137
0254-3052
DOI:10.1088/1674-1137/39/1/016004