APA (7th ed.) Citation

Martyniuk, M., Antoszewski, J., Musca, C. A., Dell, J. M., & Faraone, L. (2006). Environmental stability and cryogenic thermal cycling of low-temperature plasma-deposited silicon nitride thin films. Journal of applied physics, 99(5), 053519-053519-9. https://doi.org/10.1063/1.2179969

Chicago Style (17th ed.) Citation

Martyniuk, M., J. Antoszewski, C. A. Musca, J. M. Dell, and L. Faraone. "Environmental Stability and Cryogenic Thermal Cycling of Low-temperature Plasma-deposited Silicon Nitride Thin Films." Journal of Applied Physics 99, no. 5 (2006): 053519-053519-9. https://doi.org/10.1063/1.2179969.

MLA (9th ed.) Citation

Martyniuk, M., et al. "Environmental Stability and Cryogenic Thermal Cycling of Low-temperature Plasma-deposited Silicon Nitride Thin Films." Journal of Applied Physics, vol. 99, no. 5, 2006, pp. 053519-053519-9, https://doi.org/10.1063/1.2179969.