Linear Plasma Sources for Large Area Film Deposition： A Brief Review

By utilization of different excitation power sources, linear plasma sources can be differentiated into DC, RF, VHF, microwave and dual frequency types. Through installing several linear plasma sources in parallel or adopting the so-called roll-to-roll （air-to-air） process, scale uniform linear plasm...

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Published inPlasma science & technology Vol. 16; no. 4; pp. 356 - 362
Main Author 魏钰 左潇 陈龙威 孟月东 方世东 沈洁 舒兴胜
Format Journal Article
LanguageEnglish
Published 01.04.2014
Subjects
Deposition
Dielectrics
Magnetic fields
Measuring instruments
Microwaves
Plasma density
Thin films
Utilization
Walls
介质薄膜
等离子体密度
等离子体源
等离子源
等离子蚀刻
线性
薄膜沉积
面积
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ISSN1009-0630
DOI10.1088/1009-0630/16/4/10

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Summary:By utilization of different excitation power sources, linear plasma sources can be differentiated into DC, RF, VHF, microwave and dual frequency types. Through installing several linear plasma sources in parallel or adopting the so-called roll-to-roll （air-to-air） process, scale uniform linear plasma sources were realized and successfully applied to the deposition of large area uniform dielectric thin films, Furthermore, the magnetic field system can effectively reduce the recombination losses on the wall of the vacuum chamber and enhance the plasma density. Linear plasma sources with approximately one square meter deposition area with the plasma density of 1011 cm 3 have been developed, some of which have been used for the deposition of dielectric layers and large area plasma etching.
Bibliography:linear plasma sources, large area, uniform, high density
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By utilization of different excitation power sources, linear plasma sources can be differentiated into DC, RF, VHF, microwave and dual frequency types. Through installing several linear plasma sources in parallel or adopting the so-called roll-to-roll （air-to-air） process, scale uniform linear plasma sources were realized and successfully applied to the deposition of large area uniform dielectric thin films, Furthermore, the magnetic field system can effectively reduce the recombination losses on the wall of the vacuum chamber and enhance the plasma density. Linear plasma sources with approximately one square meter deposition area with the plasma density of 1011 cm 3 have been developed, some of which have been used for the deposition of dielectric layers and large area plasma etching.
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ISSN:1009-0630
DOI:10.1088/1009-0630/16/4/10