Final thickness reduction and development of Goss texture in C- and Al-free Fe-3%Si-0.1%Mn-0.012%S electrical steel

• Published in: Metals and materials international Vol. 23; no. 6; pp. 1223 - 1226
• Main Authors: Oh, Eun Jee, Heo, Nam Hoe, Koo, Yang Mo
• Format: Journal Article
• Language: English
• Published: Seoul The Korean Institute of Metals and Materials 01.11.2017; Springer Nature B.V; 대한금속·재료학회
• Subjects: Aluminum; Annealing; Characterization and Evaluation of Materials; Chemistry and Materials Science; Electrical steels; Engineering Thermodynamics; Grains; Heat and Mass Transfer; Iron; Machines; Magnetic induction; Magnetic Materials; Magnetic properties; Magnetism; Manganese; Manufacturing; Materials Science; Metallic Materials; Mountains; Planes; Processes; Reduction; Research Paper; Silicon steels; Solid Mechanics; Steel; Surface energy; Surface layers; Texture; 재료공학; sulfur segregation; C- and Al-free electrical steel; {110} Goss texture; thickness reduction; selective growth
• ISSN: 1598-9623; 2005-4149
• DOI: 10.1007/s12540-017-7050-9

The correlation between final thickness reduction and development of Goss texture has been investigated in a C- and Al-free Fe-3%Si electrical steel. During final annealing, the annealing texture is transited from {110}⊥ND to {100}⊥ND texture with increasing final thickness reduction. This is due to the decrease in primary grain size after pre-annealing with increasing final thickness reduction which accelerates the selective growth rate of the {100} grains at the expense of the other {hkl} grains. At an optimal final thickness reduction of 75.8%, the high magnetic induction of 1.95 Tesla, which arises from the sharp {110} Goss texture and is comparable to that of conventional grain-oriented electrical steels, is obtained from the C- and Al-free Fe-3%Si-0.1%Mn electrical steel. Such a high magnetic property is produced through the surface-energy-induced selective grain growth of the Goss grains under the lower surface-segregated condition of sulfur which makes the surface energy of the {110} plane lowest among the {hkl} planes.