Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array

A practical interference lithography scheme based on surface plasmon polaritions （SPPs） is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave （EW） carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated o...

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Bibliographic Details
Published inChinese physics letters Vol. 27; no. 9; pp. 100 - 102
Main Author 梁慧敏 王景全 范锋 秦爱丽 张春元 成惠
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.09.2010
Subjects
Arrays
Cylinders
Interference
Lenses
Nanocomposites
Nanomaterials
Nanostructure
Resists
刻蚀技术
圆柱透镜
干涉光刻
表面等离子体
透镜阵列
金属薄膜
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ISSN0256-307X
1741-3540
DOI10.1088/0256-307X/27/9/094205

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Summary:A practical interference lithography scheme based on surface plasmon polaritions （SPPs） is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave （EW） carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated on a resist, the energy of EW will launch strong SPPs and form enhanced interference nanopatterns in the resist. The simulation results confirm that a high quality nanopattern with a critical dimension of λ/7 can be achieved in the resistance. The anaJysis results indicate that the height of the cylinder lenses can provide a large tolerance to decrease the fabrication difficulty of this element.
Bibliography:11-1959/O4
TN248.1
TN946
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ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/27/9/094205