刘军伟, 张. 郑. 姜. 吕. 侯. 胡. (2010). Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method. Chinese physics letters, 27(8), 232-234. https://doi.org/10.1088/0256-307X/27/8/088103
Chicago Style (17th ed.) Citation刘军伟, 张春梅 郑艳彬 姜志刚 吕宪义 侯雪 胡双. "Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method." Chinese Physics Letters 27, no. 8 (2010): 232-234. https://doi.org/10.1088/0256-307X/27/8/088103.
MLA (9th ed.) Citation刘军伟, 张春梅 郑艳彬 姜志刚 吕宪义 侯雪 胡双. "Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method." Chinese Physics Letters, vol. 27, no. 8, 2010, pp. 232-234, https://doi.org/10.1088/0256-307X/27/8/088103.