Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method

• Published in: Chinese physics letters Vol. 27; no. 8; pp. 232 - 234
• Main Author: 张春梅 郑艳彬 姜志刚 吕宪义 侯雪 胡双 刘军伟
• Format: Journal Article
• Language: English
• Published: IOP Publishing 01.08.2010
• Subjects: Carbon dioxide; Chemical vapor deposition; CO2流量; Crystal structure; Deposition; Diamond films; Grain orientation; Orientation; Plasma (physics); 二氧化碳; 扫描电镜观察; 晶粒取向; 直流热阴极; 等离子体化学气相沉积法; 薄膜制备; 金刚石薄膜
• ISSN: 0256-307X; 1741-3540
• DOI: 10.1088/0256-307X/27/8/088103

Diamond films are deposited on Mo substrates by dc hot-cathode plasma chemical vapor deposition method using a CH4-H2-CO2 gas mixture. Adjusting the flow of CO2, we study the relevant influence on surface morphology, grain orientation and crystalline quality of films with scanning electron microscopy, x-ray diffraction, Raman spectroscopy, respectively. The results show that grain orientation of the films has a transition with the increasing CO2 addition, from （100） orientation to （110） orientation and then （111） orientation. The crystalline quality is improved but the growth rate is decreased by raising the flow of CO2. The experimental results are also discussed briefly.