High-reflectivity high-contrast grating focusing reflector on silicon-on-insulator wafer
A high-contrast grating（HCG） focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated.Basic design rules to engineer this category of structures are given in detail.A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.832...
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| Published in | Chinese physics B Vol. 25; no. 11; pp. 306 - 310 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
01.11.2016
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| Online Access | Get full text |
| ISSN | 1674-1056 2058-3834 |
| DOI | 10.1088/1674-1056/25/11/114213 |
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| Summary: | A high-contrast grating（HCG） focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated.Basic design rules to engineer this category of structures are given in detail.A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment.The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested.The test results show that the focal length is in the range of 11.81-12 mm,which is close to the designed focal length of 15 mm.The reflectivity is almost above 0.56 within a bandwidth of 50 nm.At a distance of 11.86 mm,the light is focused to a round spot with the highest concentration,which is much smaller than the size of the incident beam.The FWHM of the reflected light beam decreases to 120 nm,and the intensity increases to 1.18. |
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| Bibliography: | A high-contrast grating（HCG） focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated.Basic design rules to engineer this category of structures are given in detail.A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment.The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested.The test results show that the focal length is in the range of 11.81-12 mm,which is close to the designed focal length of 15 mm.The reflectivity is almost above 0.56 within a bandwidth of 50 nm.At a distance of 11.86 mm,the light is focused to a round spot with the highest concentration,which is much smaller than the size of the incident beam.The FWHM of the reflected light beam decreases to 120 nm,and the intensity increases to 1.18. reflector grating reflectivity wafer insulator focusing incident polarized length bandwidth 11-5639/O4 |
| ISSN: | 1674-1056 2058-3834 |
| DOI: | 10.1088/1674-1056/25/11/114213 |