An Efficient Spraying Method with Cyclodextrine‐drived Aqueous Stripper for Removing of Organic Photoresist on Indium Tin Oxide Surface
The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresi...
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| Published in | Bulletin of the Korean Chemical Society Vol. 39; no. 10; pp. 1198 - 1205 |
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| Main Authors | , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Weinheim
Wiley‐VCH Verlag GmbH & Co. KGaA
01.10.2018
대한화학회 |
| Subjects | |
| Online Access | Get full text |
| ISSN | 1229-5949 0253-2964 1229-5949 |
| DOI | 10.1002/bkcs.11576 |
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| Abstract | The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresist) material. This presents an efficient spraying process of removing the photoresist layer formed on a 260‐nm‐thick indium tin oxide substrate with a CD (cyclodextrine)‐drived aqueous stripper, simultaneously implementing proper mass transfer and heat transfer. It was taken to achieve an economical stripper consumption management by limiting the modified Weber number to 200 and the spray distance to 100 mm. As a result, stable removal performance was achieved, with optical and electric properties varying within the range of 1%, in CD drived aqueous stripping conditions (water content of the stripper composition ≤71%, stripper temperature = 40°C, and stripping time = 40 s). |
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| AbstractList | The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresist) material. This presents an efficient spraying process of removing the photoresist layer formed on a 260-nm-thick indium tin oxide substrate with a CD (cyclodextrine)-drived aqueous stripper, simultaneously implementing proper mass transfer and heat transfer. It was taken to achieve an economical stripper consumption management by limiting the modified Weber number to 200 and the spray distance to 100 mm. As a result, stable removal performance was achieved, with optical and electric properties varying within the range of 1%, in CD drived aqueous stripping conditions (water content of the stripper composition ≤71%, stripper temperature = 40°C, and stripping time = 40 s). KCI Citation Count: 0 The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresist) material. This presents an efficient spraying process of removing the photoresist layer formed on a 260‐nm‐thick indium tin oxide substrate with a CD (cyclodextrine)‐drived aqueous stripper, simultaneously implementing proper mass transfer and heat transfer. It was taken to achieve an economical stripper consumption management by limiting the modified Weber number to 200 and the spray distance to 100 mm. As a result, stable removal performance was achieved, with optical and electric properties varying within the range of 1%, in CD drived aqueous stripping conditions (water content of the stripper composition ≤71%, stripper temperature = 40°C, and stripping time = 40 s). |
| Author | Jeong, Byung Hyun Lee, Dae Won Lee, Ki‐Seong Kim, Joon Hyun Hong, Sung‐Jei Kim, Young Sung |
| Author_xml | – sequence: 1 givenname: Joon Hyun surname: Kim fullname: Kim, Joon Hyun organization: Seoul National University of Science & Technology – sequence: 2 givenname: Ki‐Seong surname: Lee fullname: Lee, Ki‐Seong organization: Seoul National University of Science & Technology – sequence: 3 givenname: Byung Hyun surname: Jeong fullname: Jeong, Byung Hyun organization: Eotech – sequence: 4 givenname: Dae Won surname: Lee fullname: Lee, Dae Won organization: DS Techopia – sequence: 5 givenname: Sung‐Jei surname: Hong fullname: Hong, Sung‐Jei organization: Display Materials and Components Research Center, Korea Electronics Technology Institute – sequence: 6 givenname: Young Sung surname: Kim fullname: Kim, Young Sung email: youngsk@seoultech.ac.kr organization: Seoul National University of Science & Technology |
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| Cites_doi | 10.1016/S0166-1280(97)00246-7 10.1002/mrc.1134 10.1021/cm300552k 10.1016/j.mee.2006.01.056 10.1146/annurev.fluid.30.1.85 |
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| Copyright | 2018 Korean Chemical Society, Seoul & Wiley‐VCH Verlag GmbH & Co. KGaA, Weinheim |
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| SubjectTerms | Aqueous stripper Full‐cone nozzle ITO‐glass Positive photoresist Removal process Spray 화학 |
| Title | An Efficient Spraying Method with Cyclodextrine‐drived Aqueous Stripper for Removing of Organic Photoresist on Indium Tin Oxide Surface |
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