An Efficient Spraying Method with Cyclodextrine‐drived Aqueous Stripper for Removing of Organic Photoresist on Indium Tin Oxide Surface

The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresi...

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Published inBulletin of the Korean Chemical Society Vol. 39; no. 10; pp. 1198 - 1205
Main Authors Kim, Joon Hyun, Lee, Ki‐Seong, Jeong, Byung Hyun, Lee, Dae Won, Hong, Sung‐Jei, Kim, Young Sung
Format Journal Article
LanguageEnglish
Published Weinheim Wiley‐VCH Verlag GmbH & Co. KGaA 01.10.2018
대한화학회
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ISSN1229-5949
0253-2964
1229-5949
DOI10.1002/bkcs.11576

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Summary:The chemical mechanism of inducing polymer breakage in a photoresist layer plays an important role in the photoresist removal from an indium tin oxide substrate. The spray structure for delivering the relevant functional material is involved in the process of binding and dissolving the PR (photoresist) material. This presents an efficient spraying process of removing the photoresist layer formed on a 260‐nm‐thick indium tin oxide substrate with a CD (cyclodextrine)‐drived aqueous stripper, simultaneously implementing proper mass transfer and heat transfer. It was taken to achieve an economical stripper consumption management by limiting the modified Weber number to 200 and the spray distance to 100 mm. As a result, stable removal performance was achieved, with optical and electric properties varying within the range of 1%, in CD drived aqueous stripping conditions (water content of the stripper composition ≤71%, stripper temperature = 40°C, and stripping time = 40 s).
Bibliography:https://onlinelibrary.wiley.com/doi/abs/10.1002/bkcs.11576
ISSN:1229-5949
0253-2964
1229-5949
DOI:10.1002/bkcs.11576