Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups

The synthesis of photocleavable poly(dimethoxynitrobenzyl acrylate)-block-polystyrene block copolymers is described. The UV irradiation of these block copolymers, dissolved in a good solvent for both blocks, selectively cleaves the dimethoxynitrobenzyl protecting groups, leading to carboxylic acid m...

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Bibliographic Details
Published inSoft matter Vol. 7; no. 15; pp. 6891 - 6896
Main Authors Bertrand, Olivier, Schumers, Jean-Marc, Kuppan, Chandrasekar, Marchand-Brynaert, Jacqueline, Fustin, Charles-André, Gohy, Jean-François
Format Journal Article
LanguageEnglish
Published 01.01.2011
Subjects
Block copolymers
Blocking
Carboxylic acids
Dyes
Micelles
Self assembly
Solvents
Synthesis
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ISSN1744-683X
1744-6848
DOI10.1039/c1sm05631j

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Summary:The synthesis of photocleavable poly(dimethoxynitrobenzyl acrylate)-block-polystyrene block copolymers is described. The UV irradiation of these block copolymers, dissolved in a good solvent for both blocks, selectively cleaves the dimethoxynitrobenzyl protecting groups, leading to carboxylic acid moieties. Since the resulting hydrophilic poly(acrylic acid) block is insoluble in the solvent used, self-assembly of the diblocks into micelles is observed. This light-induced micellization process is further used to trap dyes into the core of the micelles.
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ISSN:1744-683X
1744-6848
DOI:10.1039/c1sm05631j