Contact resistance extraction methods for short- and long-channel carbon nanotube field-effect transistors
Three different methods for the extraction of the contact resistance based on both the well-known transfer length method (TLM) and two variants of the Y-function method have been applied to simulation and experimental data of short- and long-channel CNTFETs. While for TLM special CNT test structures...
Saved in:
Published in | Solid-state electronics Vol. 125; pp. 161 - 166 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.11.2016
|
Subjects | |
Online Access | Get full text |
ISSN | 0038-1101 1879-2405 |
DOI | 10.1016/j.sse.2016.07.011 |
Cover
Summary: | Three different methods for the extraction of the contact resistance based on both the well-known transfer length method (TLM) and two variants of the Y-function method have been applied to simulation and experimental data of short- and long-channel CNTFETs. While for TLM special CNT test structures are mandatory, standard electrical device characteristics are sufficient for the Y-function methods. The methods have been applied to CNTFETs with low and high channel resistance. It turned out that the standard Y-function method fails to deliver the correct contact resistance in case of a relatively high channel resistance compared to the contact resistances. A physics-based validation is also given for the application of these methods based on applying traditional Si MOSFET theory to quasi-ballistic CNTFETs. |
---|---|
ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/j.sse.2016.07.011 |