郝跃, 樊. 刘. 马. 卓. (2013). Influences of different oxidants on the characteristics of HfAlO_x films deposited by atomic layer deposition. Chinese physics B, 22(2), 487-491. https://doi.org/10.1088/1674-1056/22/2/027702
Chicago Style (17th ed.) Citation郝跃, 樊继斌 刘红侠 马飞 卓青青. "Influences of Different Oxidants on the Characteristics of HfAlO_x Films Deposited by Atomic Layer Deposition." Chinese Physics B 22, no. 2 (2013): 487-491. https://doi.org/10.1088/1674-1056/22/2/027702.
MLA (9th ed.) Citation郝跃, 樊继斌 刘红侠 马飞 卓青青. "Influences of Different Oxidants on the Characteristics of HfAlO_x Films Deposited by Atomic Layer Deposition." Chinese Physics B, vol. 22, no. 2, 2013, pp. 487-491, https://doi.org/10.1088/1674-1056/22/2/027702.
Warning: These citations may not always be 100% accurate.