特高压1100 kV GIS现场交流耐压试验技术

为了减少开展特高压1100 kV GIS现场交流耐压试验时可能出现的问题,立足于近年来国内特高压站GIS现场试验积累的经验,从特高压1100 kV GIS的结构特点、试验方案的选择、试验频率和加压程序的考虑、试验接线中的注意事项及试验判据等各个方面对特高压1100 kV GIS现场交流耐压试验技术进行了系统性的介绍。并详细地分析了试验过程中的关键点,给出了试验参数估算的算例,为设备配置和试验电源选取提供依据。特高压1100 kV GIS交流耐压试验电压高、设备容量大、套管高度高,给现场试验带来诸多难题,应提前做好充足的准备。...

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Bibliographic Details
Published in电力系统保护与控制 Vol. 46; no. 3; pp. 158 - 163
Main Author 傅智为;林一泓;吴勇昊;卞志文;魏登峰
Format Journal Article
LanguageChinese
Published 国网福建省电力有限公司电力科学研究院,福建 福州 350007 01.02.2018
国网福建省电力有限公司,福建 福州 350003%国网福建省电力有限公司电力科学研究院,福建 福州,350007
Subjects
GIS
特高压
现场交流耐压试验
试验技术
试验设备配置
GIS
UHV
试验设备配置
试验技术
test equipment configuration
特高压
on site AC withstand voltage test
现场交流耐压试验
test technology
Online AccessGet full text
ISSN1674-3415
DOI10.7667/PSPC201788

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Summary:为了减少开展特高压1100 kV GIS现场交流耐压试验时可能出现的问题,立足于近年来国内特高压站GIS现场试验积累的经验,从特高压1100 kV GIS的结构特点、试验方案的选择、试验频率和加压程序的考虑、试验接线中的注意事项及试验判据等各个方面对特高压1100 kV GIS现场交流耐压试验技术进行了系统性的介绍。并详细地分析了试验过程中的关键点,给出了试验参数估算的算例,为设备配置和试验电源选取提供依据。特高压1100 kV GIS交流耐压试验电压高、设备容量大、套管高度高,给现场试验带来诸多难题,应提前做好充足的准备。
Bibliography:In order to reduce the problems probably happened when carrying out the on site test of UHV 1100 kV GIS, and based on the on site experience of domestic UHV substation test in recent years, the test technology of on site AC voltage test of UHV 1100 kV GIS is systematically introduced in terms of the structure characteristics of UHV 1100 kV GIS, the choice of test scheme, consideration of test frequency and voltage applied process, attentions of test wiring, and test criterion. This paper also analyzes the key points during the test in detail, and gives an estimated example of test parameters which provides the basis for equipment configuration and test source choice. Adequate preparation should be made ahead of time due to high AC withstand test voltage of 1100 kV GIS, large capacity of equipment, great height of bushing, which may bring many difficulties to the actual implementation of on site test.
UHV; GIS; on site AC withstand voltage test; test equipment configuration, test technology
FU Zhiwei1＇ 2, LIN Yi
ISSN:1674-3415
DOI:10.7667/PSPC201788