New Approaches to Nanofabrication:  Molding, Printing, and Other Techniques

Gates et al focus on research published in nanofabrication during the interval from 1999 to mid-2004 and to specific techniques demonstrated to be capable of patterning a substrate with features less than or equal to 100 nm in both lateral and vertical dimensions. In general, this definition exclude...

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Bibliographic Details
Published inChemical reviews Vol. 105; no. 4; pp. 1171 - 1196
Main Authors Gates, Byron D, Xu, Qiaobing, Stewart, Michael, Ryan, Declan, Willson, C. Grant, Whitesides, George M
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 01.04.2005
Subjects
Membranes, Artificial
Microscopy, Atomic Force - methods
Microscopy, Electron, Scanning - methods
Molds & molding
Nanostructures - chemistry
Nanotechnology
Nanotechnology - methods
Photography - methods
Surface Properties
Thin films
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ISSN0009-2665
1520-6890
DOI10.1021/cr030076o

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Summary:Gates et al focus on research published in nanofabrication during the interval from 1999 to mid-2004 and to specific techniques demonstrated to be capable of patterning a substrate with features less than or equal to 100 nm in both lateral and vertical dimensions. In general, this definition excludes techniques with control over nanoscale features in only one direction, such as the deposition of thin films.
Bibliography:istex:8C2603705BFB8414E6D4F4781FC8B4E224C710B4
ark:/67375/TPS-R3RNZBXZ-2
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ISSN:0009-2665
1520-6890
DOI:10.1021/cr030076o