Surface analysis: x-ray photoelectron spectroscopy and Auger electron spectroscopy

• Published in: Analytical chemistry (Washington) Vol. 60; no. 12; pp. 377 - 387
• Main Author: Turner, Noel H
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 15.06.1988
• Subjects: Analytical chemistry; Chemistry; Electron Probe Microanalysis; Exact sciences and technology; Spectrometric and optical methods; Spectrometry, X-Ray Emission; Chemical analysis; Coupled method; X ray photoexcitation; Microanalysis; Photoelectron spectrometry; Review; Surface analysis; Auger electron spectrometry; Bibliography
• ISSN: 0003-2700; 1520-6882
• DOI: 10.1021/ac00163a024

Literature on X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) is reviewed for the period November 1985-November 1987. XPS has been used for the study of small clusters, metal complexes, binding energy shifts, electronics, the SiO sub 2 /Si interface, failure analysis, soils, surface reactions, ceramics, mineral flotation processes and polymers. AES is employed widely for both elemental and, in many cases, chemical analysis of the near surface region. Efforts continue to make AES quantitative. Depth profile studies have been made on Cr--Ni multilayers, Ag--Cu alloys and oxidized Cr--Fe and Cr--Fe--Mo alloys. 298 ref.--D.O.N.