Surface Analysis:  X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy

• Published in: Analytical chemistry (Washington) Vol. 72; no. 12; pp. 99 - 110
• Main Authors: Turner, Noel H, Schreifels, John A
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 15.06.2000
• Subjects: Analytical chemistry; Chemical analysis; Chemistry; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Spectrometric and optical methods; Spectroscopy; Spectrum analysis; Surface structure and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); X-rays; Chemical analysis; Multicomponent analysis; Updating; Photoelectron spectrometry; Review; Surface topography; Surface analysis; Auger electron spectrometry; Bibliographic review; Surface structure
• ISSN: 0003-2700; 1520-6882; 1520-6882
• DOI: 10.1021/a10000110

This fundamental review is on the subject of X-ray photoelectron spectroscopy (XPS), also called electron spectroscopy for chemical analysis (ESCA), and Auger electron spectroscopy (AES) and will cover articles published in Chemical Abstracts between October 1997 and October 1999. The review is written in three separate parts for the convenience of the reader: section A, XPS; section B, AES; and section C, combined XPS-AES topics.