Photopatterning of Block Copolymer Thin Films

Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choi...

Full description

Saved in:
Bibliographic Details
Published inACS macro letters Vol. 5; no. 4; pp. 460 - 465
Main Authors Lane, Austin P, Maher, Michael J, Willson, C. Grant, Ellison, Christopher J
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 19.04.2016
Online AccessGet full text
ISSN2161-1653
2161-1653
DOI10.1021/acsmacrolett.6b00075

Cover

Abstract Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.
AbstractList Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.
Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.
Author Willson, C. Grant
Ellison, Christopher J
Maher, Michael J
Lane, Austin P
AuthorAffiliation Department of Chemistry
The University of Texas at Austin
McKetta Department of Chemical Engineering
AuthorAffiliation_xml – name: The University of Texas at Austin
– name: Department of Chemistry
– name: McKetta Department of Chemical Engineering
Author_xml – sequence: 1
  givenname: Austin P
  surname: Lane
  fullname: Lane, Austin P
– sequence: 2
  givenname: Michael J
  surname: Maher
  fullname: Maher, Michael J
– sequence: 3
  givenname: C. Grant
  surname: Willson
  fullname: Willson, C. Grant
– sequence: 4
  givenname: Christopher J
  surname: Ellison
  fullname: Ellison, Christopher J
  email: ellison@che.utexas.edu
BackLink https://www.ncbi.nlm.nih.gov/pubmed/35607242$$D View this record in MEDLINE/PubMed
BookMark eNqFkE1LwzAYgINMnM79A5EevXS-aT7aetPhVBjoYZ5D2qaus01qkh72741sg-FBTwnJ87zwPhdopI1WCF1hmGFI8K0sXSdLa1rl_YwXAJCyE3SeYI5jzBkZHd3HaOrcJiDAOM5yeobGhHFIE5qco_htbbzppffK6kZ_RKaOHlpTfkZz05t22ykbrdaNjhZN27lLdFrL1qnp_pyg98Xjav4cL1-fXub3y1hSTH3MIJOUkpQRSbNcppxACiDLFOecVrLKWHhVWckSlhKiKiKhqPKaEOBJWVRAJuhmN7e35mtQzouucaVqW6mVGZxIOM9ySPM8C-j1Hh2KTlWit00n7VYcVgzA3Q4IuZyzqhZl46VvjPZWNq3AIH6SiuOkYp80yPSXfJj_jwY7LfyKjRmsDrX-Vr4Bjb-NTg
CitedBy_id crossref_primary_10_1039_C8PY01777H
crossref_primary_10_1039_D2PY00121G
crossref_primary_10_1080_23746149_2018_1445558
crossref_primary_10_1021_acs_macromol_7b02485
crossref_primary_10_2494_photopolymer_33_541
crossref_primary_10_1021_acs_macromol_9b02621
crossref_primary_10_1021_acs_macromol_7b02247
crossref_primary_10_1039_C7ME00106A
crossref_primary_10_1016_j_polymer_2023_126202
crossref_primary_10_1002_admi_201801401
crossref_primary_10_1021_acs_macromol_6b02355
crossref_primary_10_1039_C8RA02273A
crossref_primary_10_1021_acs_chemmater_6b02967
crossref_primary_10_1145_3137674
crossref_primary_10_1515_zpch_2016_0800
crossref_primary_10_1002_marc_201700519
crossref_primary_10_1002_adfm_202007417
crossref_primary_10_1016_j_progpolymsci_2023_101688
crossref_primary_10_1021_acsnano_6b05390
crossref_primary_10_1016_j_polymer_2016_06_069
crossref_primary_10_1021_acsami_0c02997
crossref_primary_10_1021_acs_chemrev_2c00189
Cites_doi 10.1021/nn101616d
10.1063/1.882522
10.1002/pola.22430
10.1021/nn900343u
10.1021/ma8015745
10.1109/TEPM.2003.817714
10.1021/cm300093e
10.1038/ncomms6805
10.1021/nn5071827
10.1002/pola.27370
10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5
10.1021/ma401762n
10.1116/1.3644341
10.1021/nn3052956
10.1126/science.1157626
10.1002/marc.201100739
10.1038/nature01775
10.1021/mz500370r
10.1088/0957-4484/17/19/042
10.1021/nn1014006
10.1021/nl104080v
10.1021/mz5002349
10.2494/photopolymer.28.611
10.1002/adma.200306189
10.1021/acs.langmuir.5b00750
10.1021/acsami.5b02481
10.1557/mrs2008.179
10.1021/la1042958
10.1002/pen.760231807
10.1117/1.JMM.11.3.031303
10.1038/nnano.2013.160
10.1063/1.94126
10.1039/c3sm52607k
10.1021/ma400065t
10.1038/nphoton.2009.251
10.1002/smll.201403364
10.1126/science.276.5317.1401
10.1021/mz400389r
10.1021/ma802434g
10.1002/marc.1986.030070304
10.1002/anie.201501320
10.1021/ma401112y
10.1021/cr200440z
10.1039/C5PY00190K
10.1116/1.4763356
10.1039/b926843j
10.1002/adma.200701866
10.1021/ma201416b
10.1088/0022-3727/46/50/503001
10.1149/1.2403352
10.1021/nn501300b
10.1002/pola.25069
10.1098/rsta.2012.0306
10.1002/adma.200602708
10.1002/pola.20553
10.1021/nn100686v
10.1039/c2sm07056a
10.1021/cm9015639
10.1126/science.1106604
10.1149/1.2096594
10.1021/bk-1989-0412.ch007
10.2494/photopolymer.27.435
10.1002/adma.201403045
10.1002/adma.201301556
10.1117/1.JMM.11.3.031302
10.1021/nn901342j
10.1039/C5RA02863A
10.1021/ma302464n
10.1021/ma00155a003
10.1021/nn303416p
10.1021/am508197k
10.1557/mrs2005.249
10.1021/ma00099a045
10.1021/cm702397b
10.1021/cm403813q
10.1021/nn700164p
10.1109/TMAG.2012.2192916
10.1021/ja405628g
10.1002/pola.23237
10.1002/smll.200500474
10.1063/1.1519356
10.1021/nn101561p
10.2494/photopolymer.25.33
10.1002/adfm.200902229
10.1021/ma500411q
10.1007/12_003
10.1038/nature01937
10.1116/1.4929884
10.1002/polb.23927
10.1088/0957-4484/25/39/395301
10.1126/science.1226046
10.1039/C39850001514
10.1039/B913853F
10.1039/c4tb00491d
10.1021/ma1016264
10.1021/la991500c
10.1295/polymj.19.31
10.1002/adma.200800826
10.1002/admi.201500133
10.1039/C5RA18775C
10.1021/acsmacrolett.5b00126
10.1021/cm0493445
10.1021/ma4001594
10.1088/0957-4484/16/7/003
10.1002/(SICI)1521-4095(200006)12:11<787::AID-ADMA787>3.0.CO;2-1
ContentType Journal Article
Copyright Copyright © 2016 American Chemical Society
Copyright_xml – notice: Copyright © 2016 American Chemical Society
DBID AAYXX
CITATION
NPM
7X8
DOI 10.1021/acsmacrolett.6b00075
DatabaseName CrossRef
PubMed
MEDLINE - Academic
DatabaseTitle CrossRef
PubMed
MEDLINE - Academic
DatabaseTitleList MEDLINE - Academic

PubMed
Database_xml – sequence: 1
  dbid: NPM
  name: PubMed
  url: https://proxy.k.utb.cz/login?url=http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed
  sourceTypes: Index Database
DeliveryMethod fulltext_linktorsrc
Discipline Chemistry
EISSN 2161-1653
EndPage 465
ExternalDocumentID 35607242
10_1021_acsmacrolett_6b00075
c149995400
Genre Journal Article
GroupedDBID 55A
7~N
AABXI
ABMVS
ABUCX
ACGFS
ACS
AEESW
AENEX
AFEFF
ALMA_UNASSIGNED_HOLDINGS
AQSVZ
EBS
ED
ED~
GNL
IH9
JG
JG~
ROL
UI2
VF5
VG9
W1F
AAYXX
ABBLG
ABJNI
ABLBI
ABQRX
ADHLV
BAANH
CITATION
CUPRZ
GGK
NPM
7X8
ID FETCH-LOGICAL-a414t-508a443753a489a7630700ac71964dad8589ae8c525733ed3a0bd9f33062cbd03
IEDL.DBID ACS
ISSN 2161-1653
IngestDate Thu Jul 10 22:16:49 EDT 2025
Wed Feb 19 02:23:57 EST 2025
Tue Jul 01 01:35:08 EDT 2025
Thu Apr 24 22:59:59 EDT 2025
Thu Aug 27 13:42:09 EDT 2020
IsPeerReviewed false
IsScholarly true
Issue 4
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-a414t-508a443753a489a7630700ac71964dad8589ae8c525733ed3a0bd9f33062cbd03
Notes ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
PMID 35607242
PQID 2668907998
PQPubID 23479
PageCount 6
ParticipantIDs proquest_miscellaneous_2668907998
pubmed_primary_35607242
crossref_citationtrail_10_1021_acsmacrolett_6b00075
crossref_primary_10_1021_acsmacrolett_6b00075
acs_journals_10_1021_acsmacrolett_6b00075
ProviderPackageCode JG~
55A
AABXI
GNL
VF5
7~N
VG9
W1F
ACS
AEESW
AFEFF
ABMVS
ABUCX
IH9
AQSVZ
ED~
UI2
CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2016-04-19
PublicationDateYYYYMMDD 2016-04-19
PublicationDate_xml – month: 04
  year: 2016
  text: 2016-04-19
  day: 19
PublicationDecade 2010
PublicationPlace United States
PublicationPlace_xml – name: United States
PublicationTitle ACS macro letters
PublicationTitleAlternate ACS Macro Lett
PublicationYear 2016
Publisher American Chemical Society
Publisher_xml – name: American Chemical Society
References ref45/cit45
ref99/cit99
ref3/cit3
ref81/cit81
ref16/cit16
ref52/cit52
ref23/cit23
ref2/cit2
ref77/cit77
ref71/cit71
ref20/cit20
ref48/cit48
ref74/cit74
ref10/cit10
ref35/cit35
ref89/cit89
ref19/cit19
ref42/cit42
ref96/cit96
ref13/cit13
ref105/cit105
ref61/cit61
ref67/cit67
ref38/cit38
ref90/cit90
ref64/cit64
ref54/cit54
ref6/cit6
ref18/cit18
ref65/cit65
ref97/cit97
ref101/cit101
ref11/cit11
ref102/cit102
ref29/cit29
ref76/cit76
ref86/cit86
ref32/cit32
ref39/cit39
ref5/cit5
ref43/cit43
ref80/cit80
ref28/cit28
ref91/cit91
ref55/cit55
ref12/cit12
Fréchet J. M. J. (ref107/cit107) 1989; 60
ref66/cit66
ref22/cit22
ref33/cit33
ref87/cit87
ref106/cit106
ref44/cit44
ref70/cit70
ref98/cit98
ref9/cit9
ref27/cit27
Jacobs A. G. (ref14/cit14) 2014
ref63/cit63
ref56/cit56
ref92/cit92
ref8/cit8
ref31/cit31
ref59/cit59
ref85/cit85
ref34/cit34
ref37/cit37
ref60/cit60
ref88/cit88
ref17/cit17
ref82/cit82
ref53/cit53
ref21/cit21
ref46/cit46
ref49/cit49
ref75/cit75
ref24/cit24
ref50/cit50
ref78/cit78
ref36/cit36
ref83/cit83
ref79/cit79
ref100/cit100
ref25/cit25
ref103/cit103
ref72/cit72
ref57/cit57
ref51/cit51
ref40/cit40
ref68/cit68
ref94/cit94
ref26/cit26
ref73/cit73
ref69/cit69
ref15/cit15
ref62/cit62
ref41/cit41
ref58/cit58
Frechet J. M. J. (ref93/cit93) 1989; 60
ref95/cit95
ref108/cit108
ref104/cit104
ref4/cit4
ref30/cit30
ref47/cit47
ref84/cit84
ref1/cit1
ref7/cit7
References_xml – ident: ref41/cit41
  doi: 10.1021/nn101616d
– ident: ref4/cit4
  doi: 10.1063/1.882522
– ident: ref77/cit77
  doi: 10.1002/pola.22430
– ident: ref79/cit79
  doi: 10.1021/nn900343u
– ident: ref43/cit43
  doi: 10.1021/ma8015745
– ident: ref13/cit13
  doi: 10.1109/TEPM.2003.817714
– ident: ref81/cit81
  doi: 10.1021/cm300093e
– ident: ref38/cit38
  doi: 10.1038/ncomms6805
– ident: ref18/cit18
  doi: 10.1021/nn5071827
– ident: ref34/cit34
  doi: 10.1002/pola.27370
– ident: ref47/cit47
  doi: 10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5
– ident: ref1/cit1
  doi: 10.1021/ma401762n
– ident: ref55/cit55
  doi: 10.1116/1.3644341
– ident: ref64/cit64
  doi: 10.1021/nn3052956
– ident: ref50/cit50
  doi: 10.1126/science.1157626
– ident: ref82/cit82
  doi: 10.1002/marc.201100739
– ident: ref49/cit49
  doi: 10.1038/nature01775
– ident: ref45/cit45
  doi: 10.1021/mz500370r
– ident: ref73/cit73
  doi: 10.1088/0957-4484/17/19/042
– ident: ref2/cit2
  doi: 10.1021/nn1014006
– ident: ref65/cit65
  doi: 10.1021/nl104080v
– ident: ref59/cit59
  doi: 10.1021/mz5002349
– ident: ref46/cit46
  doi: 10.2494/photopolymer.28.611
– ident: ref68/cit68
  doi: 10.1002/adma.200306189
– ident: ref84/cit84
  doi: 10.1021/acs.langmuir.5b00750
– ident: ref54/cit54
  doi: 10.1021/acsami.5b02481
– ident: ref9/cit9
  doi: 10.1557/mrs2008.179
– ident: ref29/cit29
  doi: 10.1021/la1042958
– ident: ref94/cit94
  doi: 10.1002/pen.760231807
– ident: ref56/cit56
  doi: 10.1117/1.JMM.11.3.031303
– ident: ref21/cit21
  doi: 10.1038/nnano.2013.160
– ident: ref92/cit92
  doi: 10.1063/1.94126
– ident: ref25/cit25
  doi: 10.1039/c3sm52607k
– ident: ref61/cit61
  doi: 10.1021/ma400065t
– ident: ref12/cit12
  doi: 10.1038/nphoton.2009.251
– ident: ref75/cit75
  doi: 10.1002/smll.201403364
– volume: 60
  start-page: 174
  year: 1989
  ident: ref107/cit107
  publication-title: Polym. Mater. Sci. Eng.
– ident: ref8/cit8
  doi: 10.1126/science.276.5317.1401
– ident: ref71/cit71
  doi: 10.1021/mz400389r
– ident: ref67/cit67
  doi: 10.1021/ma802434g
– ident: ref105/cit105
  doi: 10.1002/marc.1986.030070304
– ident: ref100/cit100
  doi: 10.1002/anie.201501320
– ident: ref22/cit22
  doi: 10.1021/ma401112y
– ident: ref6/cit6
  doi: 10.1021/cr200440z
– ident: ref99/cit99
  doi: 10.1039/C5PY00190K
– ident: ref15/cit15
  doi: 10.1116/1.4763356
– ident: ref89/cit89
  doi: 10.1039/b926843j
– ident: ref39/cit39
  doi: 10.1002/adma.200701866
– ident: ref69/cit69
  doi: 10.1021/ma201416b
– ident: ref37/cit37
  doi: 10.1088/0022-3727/46/50/503001
– ident: ref91/cit91
  doi: 10.1149/1.2403352
– ident: ref10/cit10
  doi: 10.1021/nn501300b
– ident: ref86/cit86
  doi: 10.1002/pola.25069
– ident: ref7/cit7
  doi: 10.1098/rsta.2012.0306
– ident: ref30/cit30
  doi: 10.1002/adma.200602708
– ident: ref78/cit78
  doi: 10.1002/pola.20553
– ident: ref52/cit52
  doi: 10.1021/nn100686v
– ident: ref70/cit70
  doi: 10.1039/c2sm07056a
– ident: ref85/cit85
  doi: 10.1021/cm9015639
– ident: ref28/cit28
  doi: 10.1126/science.1106604
– ident: ref95/cit95
  doi: 10.1149/1.2096594
– ident: ref108/cit108
  doi: 10.1021/bk-1989-0412.ch007
– ident: ref63/cit63
  doi: 10.2494/photopolymer.27.435
– ident: ref98/cit98
  doi: 10.1002/adma.201403045
– ident: ref72/cit72
  doi: 10.1002/adma.201301556
– ident: ref57/cit57
  doi: 10.1117/1.JMM.11.3.031302
– ident: ref60/cit60
  doi: 10.1021/nn901342j
– ident: ref87/cit87
  doi: 10.1039/C5RA02863A
– ident: ref58/cit58
  doi: 10.1021/ma302464n
– ident: ref104/cit104
  doi: 10.1021/ma00155a003
– ident: ref19/cit19
  doi: 10.1021/nn303416p
– ident: ref53/cit53
  doi: 10.1021/am508197k
– ident: ref23/cit23
  doi: 10.1557/mrs2005.249
– ident: ref27/cit27
  doi: 10.1021/ma00099a045
– ident: ref74/cit74
  doi: 10.1021/cm702397b
– ident: ref33/cit33
  doi: 10.1021/cm403813q
– ident: ref17/cit17
  doi: 10.1021/nn700164p
– ident: ref36/cit36
  doi: 10.1109/TMAG.2012.2192916
– ident: ref97/cit97
  doi: 10.1021/ja405628g
– ident: ref101/cit101
  doi: 10.1002/pola.23237
– ident: ref5/cit5
  doi: 10.1002/smll.200500474
– ident: ref48/cit48
  doi: 10.1063/1.1519356
– ident: ref90/cit90
  doi: 10.1021/nn101561p
– ident: ref80/cit80
  doi: 10.2494/photopolymer.25.33
– ident: ref44/cit44
  doi: 10.1002/adfm.200902229
– start-page: 90492B
  volume-title: SPIE Advanced Lithography
  year: 2014
  ident: ref14/cit14
– ident: ref31/cit31
  doi: 10.1021/ma500411q
– ident: ref26/cit26
  doi: 10.1007/12_003
– ident: ref35/cit35
  doi: 10.1038/nature01937
– ident: ref11/cit11
  doi: 10.1116/1.4929884
– ident: ref3/cit3
  doi: 10.1002/polb.23927
– ident: ref16/cit16
  doi: 10.1088/0957-4484/25/39/395301
– ident: ref32/cit32
  doi: 10.1126/science.1226046
– ident: ref103/cit103
  doi: 10.1039/C39850001514
– ident: ref42/cit42
  doi: 10.1039/B913853F
– ident: ref102/cit102
  doi: 10.1039/c4tb00491d
– ident: ref88/cit88
  doi: 10.1021/ma1016264
– ident: ref40/cit40
  doi: 10.1021/la991500c
– ident: ref106/cit106
  doi: 10.1295/polymj.19.31
– ident: ref51/cit51
  doi: 10.1002/adma.200800826
– ident: ref62/cit62
  doi: 10.1002/admi.201500133
– ident: ref83/cit83
  doi: 10.1039/C5RA18775C
– ident: ref20/cit20
  doi: 10.1021/acsmacrolett.5b00126
– ident: ref76/cit76
  doi: 10.1021/cm0493445
– volume: 60
  start-page: 170
  year: 1989
  ident: ref93/cit93
  publication-title: Proc. Polym. Mater. Sci. Eng.
– ident: ref96/cit96
  doi: 10.1021/ma4001594
– ident: ref24/cit24
  doi: 10.1088/0957-4484/16/7/003
– ident: ref66/cit66
  doi: 10.1002/(SICI)1521-4095(200006)12:11<787::AID-ADMA787>3.0.CO;2-1
SSID ssj0000561894
Score 2.2270231
SecondaryResourceType review_article
Snippet Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains....
SourceID proquest
pubmed
crossref
acs
SourceType Aggregation Database
Index Database
Enrichment Source
Publisher
StartPage 460
Title Photopatterning of Block Copolymer Thin Films
URI http://dx.doi.org/10.1021/acsmacrolett.6b00075
https://www.ncbi.nlm.nih.gov/pubmed/35607242
https://www.proquest.com/docview/2668907998
Volume 5
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV1LT8MwDI5gHODC-zFeKhIXDhltk6XpcVRMExIPCSbtVqVpKtC2Dq3dAX499tqOl6bBtWoi2U7iz3H8mZBzqQG1qySiOooF5UYxKoUXU6mRXAQZ5xwsFL69E50uv-k1e5-B4s8MvutcKp0Nlca3dnneEIWTWyYrrpAOBlut4HF2p4JoWE57H7oAZKgjmqyqlpszEfoknX33SXOA5tThtDfIfVW2U7wz6TcmedTQ779ZHP8oyyZZL7Gn1SoWyxZZMuk2WQ2qlm87hD48j3KIorHCB-9LrFFiXYG361sB9lJ4G5qxhY0-rfbLYJjtkm77-ino0LKfAlXc4TkFLKY4ZxCgKC59BScL7HdbaQ9JuWIVyyZ8NVIjQSpjJmbKjmI_YRBVuGBKm-2RWjpKzQGxooRJz7NlLGODlIGSMyaUo4XCRBv36-QCZA3L_ZCF01S364RfFRCWCqgTVmk_1CUxOfbHGCwYRWejXgtijgX_n1WGDUGrmBZRqRlNshAgivRtD-LOOtkvLD6bkQEg9ADFHP5DniOyBqhKYMrJ8Y9JLR9PzAkglzw6nS7XD4VD6Kc
linkProvider American Chemical Society
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV3JTsMwEB2xHODCvpQ1SFw4uCS1mzhHqKgKtBUSi3qLHMcVqLRFJD3A1zOTjUWqUK9WPLI9duaNx_MG4FRqRO2qHzIdRi4TRnEmXS9iUhO5CDHOOZQo3Om6rUdx06v35qBe5MLgIGKUFKdB_G92Aecc24ZK05O7JKm6ma2bh8WUDIUQUeO-vFohUCzTEog1xDPMceu8SJqbIohMk45_m6YpeDO1O81VeCpHnD43GVQnSVjVn3_IHGee0hqs5EjUusi2zjrMmdEGLDWKAnCbwO6exwn61JTvQ7cn1rhvXaLtG1gNqqzwMTTvFpX9tJovr8N4Cx6bVw-NFsurKzAlHJEwRGZKCI7uihLSV_ifwdNvK-0RRVekIlnHViM10aVybiKu7DDy-xx9jBoq1ubbsDAaj8wuWGGfS8-zZSQjQwSCUnDuKke7isJuwq_AGc41yE9HHKSB75oT_FyAIF-ACvBCCYHOacqpWsbrP71Y2esto-n45_uTQr8BrioFSdTIjCdxgIBF-raHXmgFdjLFlxI5wkMPMc3eDPM5hqXWQ6cdtK-7t_uwjHjLpWCU4x_AQvI-MYeIaZLwKN3BXwco8RI
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3JTsMwEB2xSMCFfSlrkLhwcElqN3GOUKjYVQmQEJfIsR2BuqEmPcDXM5OmVUFCFVytxLI9tueNx34P4EhqRO0qiZmOjc-EVZxJPzBMaiIXIcY5jx4K3937l0_i-rn6PCb1hY1IsaY0T-LTqn43ScEw4J1geVtpunaXZWV_4O-mYbZKLHCEimoPo-MVAsYyl0GsIKZhnl_lw4dzv1RE7kmn393TL5gz9z31JXgZtTq_ctIs97O4rD9_EDr-q1vLsFggUud0MIVWYMp2VmG-NhSCWwPWeO1mGFvTux86RXG6iXOGPrDp1Ehh4aNtew7Jfzr1t1Y7XYen-sVj7ZIVKgtMCU9kDBGaEoJj2KKEDBXuN7gLuEoHRNVllJFVLLVSE20q59Zw5cYmTDjGGhU0sMs3YKbT7dgtcOKEyyBwpZHGEpGgFJz7ytO-ovSbCEtwjH2NilWSRnkCvOJF4wMQFQNQAj40RKQLunJSzWhN-IuN_nof0HVM-P5waOMIR5WSJapju_00QuAiQzfAaLQEmwPjj2rkCBMDxDbbf-jPAcw1zuvR7dX9zQ4sIOzyKSflhbswk_X6dg-hTRbv55P4C8v484w
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Photopatterning+of+Block+Copolymer+Thin+Films&rft.jtitle=ACS+macro+letters&rft.au=Lane%2C+Austin+P.&rft.au=Maher%2C+Michael+J.&rft.au=Willson%2C+C.+Grant&rft.au=Ellison%2C+Christopher+J.&rft.date=2016-04-19&rft.issn=2161-1653&rft.eissn=2161-1653&rft.volume=5&rft.issue=4&rft.spage=460&rft.epage=465&rft_id=info:doi/10.1021%2Facsmacrolett.6b00075&rft.externalDBID=n%2Fa&rft.externalDocID=10_1021_acsmacrolett_6b00075
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=2161-1653&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=2161-1653&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=2161-1653&client=summon