Photopatterning of Block Copolymer Thin Films

Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choi...

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Bibliographic Details
Published inACS macro letters Vol. 5; no. 4; pp. 460 - 465
Main Authors Lane, Austin P, Maher, Michael J, Willson, C. Grant, Ellison, Christopher J
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 19.04.2016
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ISSN2161-1653
2161-1653
DOI10.1021/acsmacrolett.6b00075

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Summary:Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.
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ISSN:2161-1653
2161-1653
DOI:10.1021/acsmacrolett.6b00075