Large-Area Graphene Films by Simple Solution Casting of Edge-Selectively Functionalized Graphite

We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with...

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Bibliographic Details
Published inACS nano Vol. 5; no. 6; pp. 4974 - 4980
Main Authors Bae, Seo-Yoon, Jeon, In-Yup, Yang, Jieun, Park, Noejung, Shin, Hyeon Suk, Park, Sungjin, Ruoff, Rodney S, Dai, Liming, Baek, Jong-Beom
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 28.06.2011
Subjects
Crystallization - methods
Electric Conductivity
Electrochemistry - methods
Graphite - chemistry
Microscopy, Atomic Force - methods
Microscopy, Electron, Scanning - methods
Nanostructures - chemistry
Nanotechnology - methods
Optics and Photonics
Surface Properties
edge-selective functionalization
solution processing
sheet resistance
optical transmittance
graphene film
annealing
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ISSN1936-0851
1936-086X
1936-086X
DOI10.1021/nn201072m

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Summary:We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52–3.11 kΩ/sq at 63–90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.
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ISSN:1936-0851
1936-086X
1936-086X
DOI:10.1021/nn201072m