Principles of lithography

"This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, to...

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Bibliographic Details
Main Author: Levinson, Harry J., (Author)
Format: eBook
Language: English
Published: Bellingham, Washington, USA : SPIE Press, [2019]
Edition: Fourth edition.
Subjects:
ISBN: 9781510627611
1510627618
9781510627628
1510627626
9781510627635
1510627634
9781510627604
151062760X
Physical Description: 1 online resource

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Table of contents

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001 kn-on1083675292
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 190122s2019 ohu ob 001 0 eng
040 |a DLC  |b eng  |e rda  |c DLC  |d OCLCO  |d OCLCF  |d SPIES  |d UIU  |d OCLCQ  |d UPM  |d YDX  |d OCLCO  |d OCLCQ  |d OCLCO  |d OCLCL 
020 |a 9781510627611  |q (pdf) 
020 |a 1510627618  |q (pdf) 
020 |a 9781510627628  |q (epub) 
020 |a 1510627626  |q (epub) 
020 |a 9781510627635  |q (mobi) 
020 |a 1510627634  |q (mobi) 
020 |z 9781510627604 
020 |z 151062760X 
035 |a (OCoLC)1083675292 
042 |a pcc 
100 1 |a Levinson, Harry J.,  |e author. 
245 1 0 |a Principles of lithography /  |c Harry J. Levinson. 
250 |a Fourth edition. 
264 1 |a Bellingham, Washington, USA :  |b SPIE Press,  |c [2019] 
264 4 |c ©2019 
300 |a 1 online resource 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a "This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus"--  |c Provided by publisher. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Integrated circuits  |x Design and construction. 
650 0 |a Microlithography. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Levinson, Harry J.  |t Principles of lithography.  |b Fourth edition.  |d Bellingham, Washington, USA : SPIE Press, [2019]  |z 9781510627604  |w (DLC) 2019000488 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpPLE00013/principles-of-lithography?kpromoter=marc  |y Full text