Principles of lithography

The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...

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Bibliographic Details
Main Author Levinson, Harry J.
Format Electronic eBook
LanguageEnglish
Published Bellingham, Wash. : SPIE Press, ©2010.
Edition3rd ed.
SeriesSPIE monograph ; PM198.
Subjects
Integrated circuits > Design and construction.
Microlithography.
elektronické knihy
electronic books
Online AccessFull text
ISBN9780819483256
0819483257
9781628700107
1628700106
1680150995
9781680150995
9780819483249
0819483249
Physical Description1 online resource (xiv, 503 pages) : illustrations (some color)

Cover

Table of Contents:
  • Preface to the third edition
  • Preface to the second edition
  • Preface
  • Chapter 1. Overview of lithography
  • Chapter 2. Optical pattern formation
  • Chapter 3. Photoresists
  • Chapter 4. Modeling and thin-film effects
  • Chapter 5. Wafer steppers
  • Chapter 6. Overlay
  • Chapter 7. Masks and reticles
  • Chapter 8. Confronting the diffraction limit
  • Chapter 9. Metrology
  • Chapter 10. Immersion lithography and the limits of optical lithography
  • Chapter 11. Lithography costs
  • Chapter 12. Extreme ultraviolet lithography
  • Chapter 13. Alternative lithography techniques
  • Appendix A: Coherence.

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