Principles of lithography

The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...

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Bibliographic Details
Main Author: Levinson, Harry J.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Press, ©2010.
Edition: 3rd ed.
Series: SPIE monograph ; PM198.
Subjects:
Integrated circuits > Design and construction.
Microlithography.
elektronické knihy
electronic books
ISBN: 9780819483256
0819483257
9781628700107
1628700106
1680150995
9781680150995
9780819483249
0819483249
Physical Description: 1 online resource (xiv, 503 pages) : illustrations (some color)

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Table of contents

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020 |a 1680150995 
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024 7 |a 10.1117/3.865363  |2 doi 
035 |a (OCoLC)746472242  |z (OCoLC)683257773  |z (OCoLC)698332994  |z (OCoLC)810004994  |z (OCoLC)1058044827  |z (OCoLC)1065077108  |z (OCoLC)1127214612  |z (OCoLC)1136468682 
042 |a pcc 
100 1 |a Levinson, Harry J. 
245 1 0 |a Principles of lithography /  |c Harry J. Levinson. 
250 |a 3rd ed. 
260 |a Bellingham, Wash. :  |b SPIE Press,  |c ©2010. 
300 |a 1 online resource (xiv, 503 pages) :  |b illustrations (some color) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Press monograph ;  |v 198 
504 |a Includes bibliographical references and index. 
505 0 |a Preface to the third edition -- Preface to the second edition -- Preface -- Chapter 1. Overview of lithography -- Chapter 2. Optical pattern formation -- Chapter 3. Photoresists -- Chapter 4. Modeling and thin-film effects -- Chapter 5. Wafer steppers -- Chapter 6. Overlay -- Chapter 7. Masks and reticles -- Chapter 8. Confronting the diffraction limit -- Chapter 9. Metrology -- Chapter 10. Immersion lithography and the limits of optical lithography -- Chapter 11. Lithography costs -- Chapter 12. Extreme ultraviolet lithography -- Chapter 13. Alternative lithography techniques -- Appendix A: Coherence. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Integrated circuits  |x Design and construction. 
650 0 |a Microlithography. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Levinson, Harry J.  |t Principles of lithography.  |b 3rd ed.  |d Bellingham, Wash. : SPIE Press, ©2010  |z 9780819483249  |w (DLC) 2010026775  |w (OCoLC)647976639 
830 0 |a SPIE monograph ;  |v PM198. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpPLE00005/principles-of-lithography?kpromoter=marc  |y Full text 

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