Optical lithography : here is why

• Main Author: Lin, Burn Jeng, 1942-
• Corporate Author: SPIE (Society)
• Format: eBook
• Language: English
• Published: Bellingham, Wash. : SPIE, 2010.
• Series: SPIE monograph ; PM190.
• Subjects: Microlithography.; Semiconductors > Etching.; Lasers > Industrial applications.; elektronické knihy; electronic books
• ISBN: 9780819481825; 0819481823; 9781615837274; 1615837272; 0819475602; 9780819475602
• Physical Description: 1 online resource (xiv, 477 pages) : illustrations
• Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.