Thin film processes II
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to t...
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| Other Authors | , |
|---|---|
| Format | Electronic eBook |
| Language | English |
| Published |
Boston :
Academic Press,
©1991.
|
| Series | Thin film processes ;
2 |
| Subjects | |
| Online Access | Full text |
| ISBN | 9781601192905 1601192908 0080524214 9780080524214 0127282513 9780127282510 |
| Physical Description | 1 online resource (xiii, 866 pages) : illustrations |
Cover
Table of Contents:
- Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel
- Evaporation processes / Chandra Deshpandey and Rointan Bunshah
- Molecular beam epitaxy / Peter P. Chow
- Sputter deposition processes / Robert Parsons
- The cathodic arc plasma deposition of thin films / Philip C. Johnson
- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern
- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen
- Photochemical vapor deposition / J. Gary Eden
- Sol-gel coatings / Lisa C. Klein
- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern
- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others]
- Selected area processing / Thomas M. Mayer and Susan D. Allen
- Plasma-assisted etching / Hans W. Lehmann.
- Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes
- Laser-driven etching / Carol I.H. Ashby.