Thin film processes II

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to t...

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Bibliographic Details
Other Authors: Vossen, John L., Kern, Werner, 1925-
Format: eBook
Language: English
Published: Boston : Academic Press, ©1991.
Series: Thin film processes ; 2
Subjects:
Thin films.
elektronické knihy
electronic books
ISBN: 9781601192905
1601192908
0080524214
9780080524214
0127282513
9780127282510
Physical Description: 1 online resource (xiii, 866 pages) : illustrations

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Table of contents

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008 070620s1991 maua ob 001 0 eng d
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020 |a 9781601192905  |q (electronic bk.) 
020 |a 1601192908  |q (electronic bk.) 
020 |z 0080524214 
020 |z 9780080524214 
020 |z 0127282513  |q (alk. paper) 
020 |z 9780127282510  |q (alk. paper) 
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035 |a (OCoLC)144646036  |z (OCoLC)220873555  |z (OCoLC)468758959  |z (OCoLC)961883272  |z (OCoLC)988697771  |z (OCoLC)999443399  |z (OCoLC)1057952163  |z (OCoLC)1065955722  |z (OCoLC)1340060777 
245 0 0 |a Thin film processes II /  |c edited by John L. Vossen, Werner Kern. 
246 3 |a Thin film processes two 
260 |a Boston :  |b Academic Press,  |c ©1991. 
300 |a 1 online resource (xiii, 866 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 0 |a Thin film processes ;  |v 2 
504 |a Includes bibliographical references and index. 
505 0 |a Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel -- Evaporation processes / Chandra Deshpandey and Rointan Bunshah -- Molecular beam epitaxy / Peter P. Chow -- Sputter deposition processes / Robert Parsons -- The cathodic arc plasma deposition of thin films / Philip C. Johnson -- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern -- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen -- Photochemical vapor deposition / J. Gary Eden -- Sol-gel coatings / Lisa C. Klein -- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern -- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others] -- Selected area processing / Thomas M. Mayer and Susan D. Allen -- Plasma-assisted etching / Hans W. Lehmann. 
505 0 |a Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes -- Laser-driven etching / Carol I.H. Ashby. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Thin films. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Vossen, John L. 
700 1 |a Kern, Werner,  |d 1925-  |1 https://id.oclc.org/worldcat/entity/E39PCjB9DGGdCFg3J7VgQ6BMKb 
776 0 8 |i Print version:  |t Thin film processes II.  |d Boston : Academic Press, ©1991  |z 0127282513  |w (DLC) 90020758  |w (OCoLC)22623928 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpTFPII00G/thin-film-processes?kpromoter=marc  |y Full text 

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