Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis

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Bibliographic Details
Other Authors: Cuomo, J. J., Rossnagel, Stephen M., Kaufman, Harold R.
Format: eBook
Language: English
Published: Westwood, N.J. : Noyes Publications, ©1989.
Edition: Reprint ed.
Subjects:
Ion implantation.
Ion bombardment > Industrial applications.
elektronické knihy
electronic books
ISBN: 1591249791
9781591249795
Physical Description: 1 online resource (xviii, 438 pages) : illustrations

Cover

Table of contents

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001 kn-ocm70894827
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 060815s1989 njua ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d DEBSZ  |d OCLCQ  |d KNOVL  |d ZCU  |d OCLCF  |d KNOVL  |d OCLCQ  |d RIC  |d OCLCQ  |d UAB  |d OCLCQ  |d CEF  |d RRP  |d YOU  |d S2H  |d OCLCO  |d OCLCQ  |d OCLCO  |d OCLCQ  |d OCLCL  |d SXB 
020 |a 1591249791  |q (electronic bk.) 
020 |a 9781591249795  |q (electronic bk.) 
035 |a (OCoLC)70894827 
245 0 0 |a Handbook of ion beam processing technology :  |b principles, deposition, film modification, and synthesis /  |c edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman. 
250 |a Reprint ed. 
260 |a Westwood, N.J. :  |b Noyes Publications,  |c ©1989. 
300 |a 1 online resource (xviii, 438 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman -- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Electron cyclotron resonance (ECR) ion sources / William M. Holber -- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman -- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi -- Quantitative sputtering / Peer C. Zalm -- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway [and others] -- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock. 
505 0 |a The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner -- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel -- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee -- Etching with directed beams / Michael Geis [and others] -- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller -- Interface structure and thin film adhesion / John Baglin -- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley -- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho. 
505 0 |a Topography : texturing effects / Bruce A. Banks -- Methods and techniques of ion beam processes / Stephen M. Rossnagel -- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield -- Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Ion implantation. 
650 0 |a Ion bombardment  |x Industrial applications. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Cuomo, J. J. 
700 1 |a Rossnagel, Stephen M. 
700 1 |a Kaufman, Harold R. 
776 0 8 |i Print version:  |t Handbook of ion beam processing technology.  |b Reprint ed.  |d Westwood, N.J. : Noyes Publications, ©1989  |z 081551199X  |w (DLC) 88038244  |w (OCoLC)18907337 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHIBPTPD3/handbook-of-ion?kpromoter=marc  |y Full text 

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