Characterization in silicon processing
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...
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Other Authors: | |
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Format: | eBook |
Language: | English |
Published: |
Boston : Greenwich :
Butterworth-Heinemann ; Manning,
©1993.
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Series: | Materials characterization series.
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Subjects: | |
ISBN: | 1591245257 9781591245254 9780080523422 0080523420 9780750691727 0750691727 |
Physical Description: | 1 online resource (xiii, 240 pages) : illustrations |
LEADER | 03033cam a2200469 a 4500 | ||
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001 | kn-ocm53032668 | ||
003 | OCoLC | ||
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020 | |z 0750691727 | ||
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042 | |a dlr | ||
245 | 0 | 0 | |a Characterization in silicon processing / |c editor, Yale Strusser ; consulting editors, C.R. Brundle, Gary E. McGuire ; managing editor, Lee E. Fitzpatrick. |
260 | |a Boston : |b Butterworth-Heinemann ; |a Greenwich : |b Manning, |c ©1993. | ||
300 | |a 1 online resource (xiii, 240 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
490 | 1 | |a Materials characterization series | |
504 | |a Includes bibliographical references and index. | ||
506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty | ||
520 | |a This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems. | ||
590 | |a Knovel |b Knovel (All titles) | ||
650 | 0 | |a Silicon. | |
650 | 0 | |a Electric conductors. | |
650 | 0 | |a Semiconductor films. | |
650 | 0 | |a Surface chemistry. | |
655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
655 | 9 | |a electronic books |2 eczenas | |
700 | 1 | |a Strausser, Yale. | |
776 | 0 | 8 | |i Print version: |t Characterization in silicon processing. |d Boston : Butterworth-Heinemann ; Greenwich : Manning, ©1993 |z 0750691727 |
830 | 0 | |a Materials characterization series. | |
856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpCSP00001/characterization-in-silicon?kpromoter=marc |y Full text |