Ionized-cluster beam deposition and epitaxy

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited...

Full description

Saved in:
Bibliographic Details
Main Author: Takagi, Toshinori.
Format: eBook
Language: English
Published: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1988.
Series: Materials science and process technology series.
Subjects:
Epitaxy.
Thin film devices > Design and construction.
elektronické knihy
electronic books
ISBN: 1591241073
9781591241072
9780815511687
081551168X
Physical Description: 1 online resource (viii, 231 pages) : illustrations

Cover

Table of contents

LEADER 02739cam a2200421 a 4500
001 kn-ocm49708648
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 011108s1988 njua ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d COF  |d DEBSZ  |d OCLCQ  |d KNOVL  |d ZCU  |d OCLCE  |d KNOVL  |d OCLCF  |d KNOVL  |d OCLCQ  |d VT2  |d OCLCQ  |d UAB  |d BUF  |d CEF  |d RRP  |d AU@  |d WYU  |d S2H  |d UX1  |d OCLCO  |d OCLCQ  |d COA  |d OCLCO  |d OCLCL  |d SXB 
020 |a 1591241073  |q (electronic bk.) 
020 |a 9781591241072  |q (electronic bk.) 
020 |a 9780815511687 
020 |a 081551168X 
024 8 |a (WaSeSS)ssj0000072395 
035 |a (OCoLC)49708648  |z (OCoLC)49270426  |z (OCoLC)582498415  |z (OCoLC)961885645  |z (OCoLC)978096655  |z (OCoLC)988636479  |z (OCoLC)999441703  |z (OCoLC)1044631843  |z (OCoLC)1056439144  |z (OCoLC)1057912349  |z (OCoLC)1060907137  |z (OCoLC)1065916969  |z (OCoLC)1075544058  |z (OCoLC)1117084292  |z (OCoLC)1151992458  |z (OCoLC)1229060773  |z (OCoLC)1340076985 
042 |a dlr 
100 1 |a Takagi, Toshinori. 
245 1 0 |a Ionized-cluster beam deposition and epitaxy /  |c by Toshinori Takagi. 
260 |a Park Ridge, N.J., U.S.A. :  |b Noyes Publications,  |c ©1988. 
300 |a 1 online resource (viii, 231 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin. 
504 |a Includes bibliographical references and index. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Epitaxy. 
650 0 |a Thin film devices  |x Design and construction. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Takagi, Toshinori.  |t Ionized-cluster beam deposition and epitaxy.  |d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1988  |z 081551168X  |w (DLC) 88017884  |w (OCoLC)18050859 
830 0 |a Materials science and process technology series. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpICBDE005/ionized-cluster-beam?kpromoter=marc  |y Full text 

Similar Items