Ionized-cluster beam deposition and epitaxy
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited...
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| Main Author: | |
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| Format: | eBook |
| Language: | English |
| Published: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
©1988.
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| Series: | Materials science and process technology series.
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| Subjects: | |
| ISBN: | 1591241073 9781591241072 9780815511687 081551168X |
| Physical Description: | 1 online resource (viii, 231 pages) : illustrations |
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Table of contents
| Summary: | The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1591241073 9781591241072 9780815511687 081551168X |
| Access: | Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty |
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