High density plasma sources : design, physics, and performance

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...

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Bibliographic Details
Other Authors: Popov, Oleg A.
Format: eBook
Language: English
Published: Park Ridge, N.J. : Noyes Publications, ©1995.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
Plasma density.
High temperature plasmas.
Plasma generators.
elektronické knihy
electronic books
ISBN: 1591240638
9781591240631
9780815513773
0815513771
9780080946160
008094616X
9780815517887
0815517882
1282755080
9781282755086
9786612755088
6612755083
1282253212
9781282253216
9786612253218
6612253215
0815517890
9780815517894
Physical Description: 1 online resource (xx, 445 pages) : illustrations

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Table of contents

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001 kn-ocm49708645
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 011108s1995 njua ob 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d COO  |d DEBSZ  |d OCLCQ  |d YDXCP  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d VRC  |d OPELS  |d N$T  |d IDEBK  |d E7B  |d OCLCQ  |d KNOVL  |d OCLCQ  |d VT2  |d OCLCQ  |d UAB  |d D6H  |d OCLCQ  |d CEF  |d RRP  |d AU@  |d WYU  |d LEAUB  |d HS0  |d UKBTH  |d OCLCO  |d UKAHL  |d OCLCQ  |d COA  |d OCLCO  |d OCLCL  |d SXB 
020 |a 1591240638  |q (electronic bk.) 
020 |a 9781591240631  |q (electronic bk.) 
020 |a 9780815513773 
020 |a 0815513771 
020 |a 9780080946160  |q (e-book) 
020 |a 008094616X  |q (e-book) 
020 |a 9780815517887  |q (electronic bk.) 
020 |a 0815517882  |q (electronic bk.) 
020 |a 1282755080 
020 |a 9781282755086 
020 |a 9786612755088 
020 |a 6612755083 
020 |a 1282253212 
020 |a 9781282253216 
020 |a 9786612253218 
020 |a 6612253215 
020 |a 0815517890 
020 |a 9780815517894 
020 |z 9780815517894 
024 8 |a (WaSeSS)ssj0000072289 
035 |a (OCoLC)49708645  |z (OCoLC)49270409  |z (OCoLC)281603527  |z (OCoLC)313495240  |z (OCoLC)647803547  |z (OCoLC)961885641  |z (OCoLC)988635599  |z (OCoLC)999408278  |z (OCoLC)1057971874  |z (OCoLC)1065955825  |z (OCoLC)1109102134  |z (OCoLC)1113026798  |z (OCoLC)1340053864 
245 0 0 |a High density plasma sources :  |b design, physics, and performance /  |c edited by Oleg A. Popov. 
260 |a Park Ridge, N.J. :  |b Noyes Publications,  |c ©1995. 
300 |a 1 online resource (xx, 445 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
504 |a Includes bibliographical references and index. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 2 |a This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. 
505 0 |a Helicon Plasma Sources -- Planar Inductive Sources -- Electrostatically-Shielded Inductively-Coupled RF Plasma Sources -- Very High Frequency Capacitive Plasma Sources -- Surface Wave Plasma Sources -- Microwave Plasma Disk Processing Machines -- Electron Cyclotron Resonance Plasma Sources -- Distributed ECR Plasma Sources -- References -- Index. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Plasma density. 
650 0 |a High temperature plasmas. 
650 0 |a Plasma generators. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Popov, Oleg A. 
776 0 8 |i Print version:  |t High density plasma sources.  |d Park Ridge, N.J. : Noyes Publications, ©1995  |z 0815513771  |w (DLC) 95004918  |w (OCoLC)32666280 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHDPSDPP1/high-density-plasma?kpromoter=marc  |y Full text 

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