High density plasma sources : design, physics, and performance
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
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| Other Authors: | |
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| Format: | eBook |
| Language: | English |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
©1995.
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| Series: | Materials science and process technology series. Electronic materials and process technology.
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| Subjects: | |
| ISBN: | 1591240638 9781591240631 9780815513773 0815513771 9780080946160 008094616X 9780815517887 0815517882 1282755080 9781282755086 9786612755088 6612755083 1282253212 9781282253216 9786612253218 6612253215 0815517890 9780815517894 |
| Physical Description: | 1 online resource (xx, 445 pages) : illustrations |
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Table of contents
| Summary: | This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1591240638 9781591240631 9780815513773 0815513771 9780080946160 008094616X 9780815517887 0815517882 1282755080 9781282755086 9786612755088 6612755083 1282253212 9781282253216 9786612253218 6612253215 0815517890 9780815517894 |
| Access: | Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty |
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