Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control

Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processin...

Full description

Saved in:
Bibliographic Details
Main Author: Mattox, D. M.
Format: eBook
Language: English
Published: Westwood, N.J. : Noyes Publications, ©1998.
Subjects:
Vapor-plating > Handbooks, manuals, etc.
elektronické knihy
electronic books
ISBN: 1591240794
9781591240792
9780815514220
0815514220
Physical Description: 1 online resource (xxvii, 917 pages) : illustrations

Cover

Table of contents

LEADER 03215cam a2200385 a 4500
001 kn-ocm49708622
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 011106s1998 njua obf 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d DEBSZ  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d OCLCQ  |d OCLCO  |d OPELS  |d UWW  |d KNOVL  |d OCL  |d OCLCQ  |d VT2  |d OCLCQ  |d BUF  |d D6H  |d CEF  |d RRP  |d AU@  |d WYU  |d LEAUB  |d COM  |d OCLCO  |d OCLCQ  |d COA  |d OCLCO  |d OCLCL  |d OCLCQ 
020 |a 1591240794  |q (electronic bk.) 
020 |a 9781591240792  |q (electronic bk.) 
020 |a 9780815514220 
020 |a 0815514220 
024 8 |a (WaSeSS)ssj0000072232 
035 |a (OCoLC)49708622  |z (OCoLC)49270322  |z (OCoLC)281593731  |z (OCoLC)639757318  |z (OCoLC)961887604  |z (OCoLC)988713919  |z (OCoLC)999474605  |z (OCoLC)1057972107  |z (OCoLC)1065923630  |z (OCoLC)1340058153 
100 1 |a Mattox, D. M. 
245 1 0 |a Handbook of physical vapor deposition (PVD) processing :  |b film formation, adhesion, surface preparation and contamination control /  |c by Donald M. Mattox. 
260 |a Westwood, N.J. :  |b Noyes Publications,  |c ©1998. 
300 |a 1 online resource (xxvii, 917 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processing. Also covers the more widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. 
504 |a Includes bibliographical references and index. 
505 0 |a Introduction -- Substrate (""Real"") Surfaces and Surface Modification -- The Low-Pressure Gas and Vacuum Processing Environment -- The Low-Pressure Plasma Processing Environment -- Vacuum Evaporation and Vacuum Deposition -- Physical Sputtering and Sputter Deposition (Sputtering) -- Arc Vapor Deposition -- Ion Plating and Ion Beam Assisted Deposition -- Atomistic Film Growth and Some Growth-Related Film Properties -- Film Characterization and Some Basic Film Properties -- Addhesion and Deadhesion -- Cleaning -- External Processing Environment -- APPENDIX 1: Reference Material -- APPENDIX 2: Transfer of Technology from R & D to Manufacturing -- Glossary of Terms and Acronyms Used in Surface Engineering. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Vapor-plating  |v Handbooks, manuals, etc. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Mattox, D.M.  |t Handbook of physical vapor deposition (PVD) processing.  |d Westwood, N.J. : Noyes Publications, ©1998  |z 0815514220  |w (DLC) 97044664  |w (OCoLC)37806270 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHPVDPVD3/handbook-of-physical?kpromoter=marc  |y Full text 

Similar Items