Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control
Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processin...
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| Main Author: | |
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| Format: | eBook |
| Language: | English |
| Published: |
Westwood, N.J. :
Noyes Publications,
©1998.
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| Subjects: | |
| ISBN: | 1591240794 9781591240792 9780815514220 0815514220 |
| Physical Description: | 1 online resource (xxvii, 917 pages) : illustrations |
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Table of contents
| Summary: | Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processing. Also covers the more widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1591240794 9781591240792 9780815514220 0815514220 |
| Access: | Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty |
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