Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
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| Other Authors | , , |
|---|---|
| Format | Electronic eBook |
| Language | English |
| Published |
Park Ridge, N.J. :
Noyes Publications,
©1990.
|
| Series | Materials science and process technology series.
|
| Subjects | |
| Online Access | Full text |
| ISBN | 1591242975 9781591242970 9780815512202 0815512201 |
| Physical Description | 1 online resource (xxiii, 523 pages) : illustrations |
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| 020 | |a 9781591242970 |q (electronic bk.) | ||
| 020 | |a 9780815512202 | ||
| 020 | |a 0815512201 | ||
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| 245 | 0 | 0 | |a Handbook of plasma processing technology : |b fundamentals, etching, deposition, and surface interactions / |c edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. |
| 260 | |a Park Ridge, N.J. : |b Noyes Publications, |c ©1990. | ||
| 300 | |a 1 online resource (xxiii, 523 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials science and process technology series | |
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty | ||
| 520 | |a An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 590 | |a Knovel |b Knovel (All titles) | ||
| 650 | 0 | |a Plasma engineering. | |
| 650 | 0 | |a Semiconductors |x Etching. | |
| 650 | 0 | |a Plasma etching. | |
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 700 | 1 | |a Rossnagel, Stephen M. | |
| 700 | 1 | |a Cuomo, J. J. | |
| 700 | 1 | |a Westwood, William D. |q (William Dickson), |d 1937- | |
| 776 | 0 | 8 | |i Print version: |t Handbook of plasma processing technology. |d Park Ridge, N.J. : Noyes Publications, ©1990 |z 0815512201 |w (DLC) 89022834 |w (OCoLC)20265048 |
| 830 | 0 | |a Materials science and process technology series. | |
| 856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHPPTFED3/handbook-of-plasma?kpromoter=marc |y Full text |