Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

Saved in:
Bibliographic Details
Other Authors: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. 1937-
Format: eBook
Language: English
Published: Park Ridge, N.J. : Noyes Publications, ©1990.
Series: Materials science and process technology series.
Subjects:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
elektronické knihy
electronic books
ISBN: 1591242975
9781591242970
9780815512202
0815512201
Physical Description: 1 online resource (xxiii, 523 pages) : illustrations

Cover

Table of contents

LEADER 02538cam a2200445 a 4500
001 kn-ocm49708585
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 020204s1990 njua obf 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d OCLCG  |d DEBSZ  |d OCLCQ  |d KNOVL  |d OCLCO  |d KNOVL  |d OCLCF  |d ZCU  |d OCLCQ  |d E7B  |d COO  |d KNOVL  |d OCLCQ  |d VT2  |d OCLCQ  |d BUF  |d CEF  |d RRP  |d AU@  |d WYU  |d OCLCO  |d OCLCQ  |d COA  |d OCLCO  |d SXB 
020 |a 1591242975  |q (electronic bk.) 
020 |a 9781591242970  |q (electronic bk.) 
020 |a 9780815512202 
020 |a 0815512201 
024 8 |a (WaSeSS)ssj0000072233 
035 |a (OCoLC)49708585  |z (OCoLC)49411323  |z (OCoLC)468755177  |z (OCoLC)646783016  |z (OCoLC)961885618  |z (OCoLC)988636478  |z (OCoLC)999441702  |z (OCoLC)1057938460  |z (OCoLC)1065922859  |z (OCoLC)1340111504 
245 0 0 |a Handbook of plasma processing technology :  |b fundamentals, etching, deposition, and surface interactions /  |c edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. 
260 |a Park Ridge, N.J. :  |b Noyes Publications,  |c ©1990. 
300 |a 1 online resource (xxiii, 523 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields. 
504 |a Includes bibliographical references and index. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Plasma engineering. 
650 0 |a Semiconductors  |x Etching. 
650 0 |a Plasma etching. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Rossnagel, Stephen M. 
700 1 |a Cuomo, J. J. 
700 1 |a Westwood, William D.  |q (William Dickson),  |d 1937- 
776 0 8 |i Print version:  |t Handbook of plasma processing technology.  |d Park Ridge, N.J. : Noyes Publications, ©1990  |z 0815512201  |w (DLC) 89022834  |w (OCoLC)20265048 
830 0 |a Materials science and process technology series. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHPPTFED3/handbook-of-plasma?kpromoter=marc  |y Full text 

Similar Items