Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

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Bibliographic Details
Other Authors Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. 1937-
Format Electronic eBook
LanguageEnglish
Published Park Ridge, N.J. : Noyes Publications, ©1990.
SeriesMaterials science and process technology series.
Subjects
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
elektronické knihy
electronic books
Online AccessFull text
ISBN1591242975
9781591242970
9780815512202
0815512201
Physical Description1 online resource (xxiii, 523 pages) : illustrations

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Summary:An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Bibliography:Includes bibliographical references and index.
ISBN:1591242975
9781591242970
9780815512202
0815512201
Access:Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty
Physical Description:1 online resource (xxiii, 523 pages) : illustrations

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