Handbook of semiconductor wafer cleaning technology : science, technology, and applications

Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.

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Bibliographic Details
Other Authors: Kern, Werner, 1925-
Format: eBook
Language: English
Published: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1993.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
ISBN: 159124093X
9781591240938
9780815513315
0815513313
0815517726
9780815517726
Physical Description: 1 online resource (xx, 623 pages) : illustrations

Cover

Table of contents

LEADER 02763cam a2200445 a 4500
001 kn-ocm49708232
003 OCoLC
005 20240717213016.0
006 m o d
007 cr cn|||||||||
008 011108s1993 njua obf 001 0 eng d
040 |a KNOVL  |b eng  |e pn  |c KNOVL  |d OCLCQ  |d TEF  |d OCLCG  |d DEBSZ  |d OCLCQ  |d KNOVL  |d OCLCO  |d ZCU  |d KNOVL  |d OCLCF  |d OCLCE  |d UWW  |d KNOVL  |d OCLCQ  |d VT2  |d OCLCQ  |d RRP  |d AU@  |d WYU  |d SFB  |d OCLCO  |d OCLCQ  |d COA  |d OCLCO  |d OCLCL  |d SXB 
020 |a 159124093X  |q (electronic bk.) 
020 |a 9781591240938  |q (electronic bk.) 
020 |a 9780815513315 
020 |a 0815513313 
020 |a 0815517726 
020 |a 9780815517726 
024 8 |a (WaSeSS)ssj0000403923 
035 |a (OCoLC)49708232  |z (OCoLC)49270483  |z (OCoLC)301111620  |z (OCoLC)621623948  |z (OCoLC)639755355  |z (OCoLC)961885821  |z (OCoLC)988697551  |z (OCoLC)999442948  |z (OCoLC)1057915838  |z (OCoLC)1058423408  |z (OCoLC)1065699631  |z (OCoLC)1136430160  |z (OCoLC)1167254155  |z (OCoLC)1180553147  |z (OCoLC)1340062683 
042 |a dlr 
245 0 0 |a Handbook of semiconductor wafer cleaning technology :  |b science, technology, and applications /  |c edited by Werner Kern. 
260 |a Park Ridge, N.J., U.S.A. :  |b Noyes Publications,  |c ©1993. 
300 |a 1 online resource (xx, 623 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field. 
504 |a Includes bibliographical references and index. 
505 0 |a 12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods / Richard S. Hockett -- 13. Future Directions / Werner Kern. 
590 |a Knovel  |b Knovel (All titles) 
650 0 |a Semiconductor wafers  |x Cleaning. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Kern, Werner,  |d 1925- 
776 0 8 |i Print version:  |t Handbook of semiconductor wafer cleaning technology.  |d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1993  |z 0815513313  |w (DLC) 93004078  |w (OCoLC)27976222 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor?kpromoter=marc  |y Full text