Handbook of semiconductor wafer cleaning technology : science, technology, and applications
Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.
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Other Authors: | |
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Format: | eBook |
Language: | English |
Published: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
©1993.
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Series: | Materials science and process technology series. Electronic materials and process technology.
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Subjects: | |
ISBN: | 159124093X 9781591240938 9780815513315 0815513313 0815517726 9780815517726 |
Physical Description: | 1 online resource (xx, 623 pages) : illustrations |
LEADER | 02763cam a2200445 a 4500 | ||
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001 | kn-ocm49708232 | ||
003 | OCoLC | ||
005 | 20240717213016.0 | ||
006 | m o d | ||
007 | cr cn||||||||| | ||
008 | 011108s1993 njua obf 001 0 eng d | ||
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020 | |a 9781591240938 |q (electronic bk.) | ||
020 | |a 9780815513315 | ||
020 | |a 0815513313 | ||
020 | |a 0815517726 | ||
020 | |a 9780815517726 | ||
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042 | |a dlr | ||
245 | 0 | 0 | |a Handbook of semiconductor wafer cleaning technology : |b science, technology, and applications / |c edited by Werner Kern. |
260 | |a Park Ridge, N.J., U.S.A. : |b Noyes Publications, |c ©1993. | ||
300 | |a 1 online resource (xx, 623 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
490 | 1 | |a Materials science and process technology series. Electronic materials and process technology | |
506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty | ||
520 | |a Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field. | ||
504 | |a Includes bibliographical references and index. | ||
505 | 0 | |a 12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods / Richard S. Hockett -- 13. Future Directions / Werner Kern. | |
590 | |a Knovel |b Knovel (All titles) | ||
650 | 0 | |a Semiconductor wafers |x Cleaning. | |
655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
655 | 9 | |a electronic books |2 eczenas | |
700 | 1 | |a Kern, Werner, |d 1925- | |
776 | 0 | 8 | |i Print version: |t Handbook of semiconductor wafer cleaning technology. |d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1993 |z 0815513313 |w (DLC) 93004078 |w (OCoLC)27976222 |
830 | 0 | |a Materials science and process technology series. |p Electronic materials and process technology. | |
856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor?kpromoter=marc |y Full text |