Handbook of semiconductor wafer cleaning technology : science, technology, and applications
Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.
Saved in:
| Other Authors | |
|---|---|
| Format | Electronic eBook |
| Language | English |
| Published |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
©1993.
|
| Series | Materials science and process technology series. Electronic materials and process technology.
|
| Subjects | |
| Online Access | Full text |
| ISBN | 159124093X 9781591240938 9780815513315 0815513313 0815517726 9780815517726 |
| Physical Description | 1 online resource (xx, 623 pages) : illustrations |
Cover
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | kn-ocm49708232 | ||
| 003 | OCoLC | ||
| 005 | 20240717213016.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 011108s1993 njua obf 001 0 eng d | ||
| 040 | |a KNOVL |b eng |e pn |c KNOVL |d OCLCQ |d TEF |d OCLCG |d DEBSZ |d OCLCQ |d KNOVL |d OCLCO |d ZCU |d KNOVL |d OCLCF |d OCLCE |d UWW |d KNOVL |d OCLCQ |d VT2 |d OCLCQ |d RRP |d AU@ |d WYU |d SFB |d OCLCO |d OCLCQ |d COA |d OCLCO |d OCLCL |d SXB | ||
| 020 | |a 159124093X |q (electronic bk.) | ||
| 020 | |a 9781591240938 |q (electronic bk.) | ||
| 020 | |a 9780815513315 | ||
| 020 | |a 0815513313 | ||
| 020 | |a 0815517726 | ||
| 020 | |a 9780815517726 | ||
| 024 | 8 | |a (WaSeSS)ssj0000403923 | |
| 035 | |a (OCoLC)49708232 |z (OCoLC)49270483 |z (OCoLC)301111620 |z (OCoLC)621623948 |z (OCoLC)639755355 |z (OCoLC)961885821 |z (OCoLC)988697551 |z (OCoLC)999442948 |z (OCoLC)1057915838 |z (OCoLC)1058423408 |z (OCoLC)1065699631 |z (OCoLC)1136430160 |z (OCoLC)1167254155 |z (OCoLC)1180553147 |z (OCoLC)1340062683 | ||
| 042 | |a dlr | ||
| 245 | 0 | 0 | |a Handbook of semiconductor wafer cleaning technology : |b science, technology, and applications / |c edited by Werner Kern. |
| 260 | |a Park Ridge, N.J., U.S.A. : |b Noyes Publications, |c ©1993. | ||
| 300 | |a 1 online resource (xx, 623 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials science and process technology series. Electronic materials and process technology | |
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty | ||
| 520 | |a Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a 12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods / Richard S. Hockett -- 13. Future Directions / Werner Kern. | |
| 590 | |a Knovel |b Knovel (All titles) | ||
| 650 | 0 | |a Semiconductor wafers |x Cleaning. | |
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 700 | 1 | |a Kern, Werner, |d 1925- | |
| 776 | 0 | 8 | |i Print version: |t Handbook of semiconductor wafer cleaning technology. |d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1993 |z 0815513313 |w (DLC) 93004078 |w (OCoLC)27976222 |
| 830 | 0 | |a Materials science and process technology series. |p Electronic materials and process technology. | |
| 856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=https://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook-of-semiconductor?kpromoter=marc |y Full text |