Nanofabrication : principles, capabilities and limits

This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of...

Full description

Saved in:
Bibliographic Details
Main Author Cui, Zheng, 1954- (Author)
Format Electronic eBook
LanguageEnglish
Published Switzerland : Springer, [2016]
EditionSecond edition.
Subjects
Nanotechnology.
Nanomanufacturing.
elektronické knihy
electronic books
Online AccessFull text
ISBN9783319393612
9783319393599
Physical Description1 online resource

Cover

LEADER 00000cam a2200000Ii 4500
001 99274
003 CZ-ZlUTB
005 20251008111945.0
006 m o d
007 cr cnu|||unuuu
008 160812t20162017sz ob 001 0 eng d
040 |a N$T  |b eng  |e rda  |e pn  |c N$T  |d GW5XE  |d IDEBK  |d OCLCQ  |d EBLCP  |d OCLCF  |d N$T  |d YDX  |d DEBBG  |d IDB  |d UAB  |d IOG  |d MERER  |d ESU  |d Z5A  |d OCLCQ  |d JBG  |d IAD  |d ICW  |d ICN  |d OTZ  |d OCLCQ  |d U3W  |d CAUOI  |d KSU  |d OCLCQ  |d UKMGB  |d OCLCQ  |d S2H  |d UKAHL  |d OCLCQ 
020 |a 9783319393612  |q (electronic bk.) 
020 |z 9783319393599  |q (print) 
035 |a (OCoLC)956539420  |z (OCoLC)960711599  |z (OCoLC)1117214133 
100 1 |a Cui, Zheng,  |d 1954-  |e author. 
245 1 0 |a Nanofabrication :  |b principles, capabilities and limits /  |c Zheng Cui. 
250 |a Second edition. 
264 1 |a Switzerland :  |b Springer,  |c [2016] 
264 4 |c ©2017 
300 |a 1 online resource 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Preface; Preface to the First Edition; Contents; Chapter 1: Introduction; 1.1 What Is Nanofabrication; 1.2 Classification of€Nanofabrication; 1.3 Purpose of€the€Book; Chapter 2: Nanofabrication by Photons; 2.1 Introduction; 2.2 Principle of€Optical Projection Lithography; 2.3 Basics of€Photoresists; 2.3.1 Process of€Optical Lithography; 2.3.2 Characteristics of€Photoresists; 2.4 Optical Lithography at Shorter Wavelengths; 2.4.1 Deep UV; 2.4.2 Extreme UV; 2.4.2.1 EUV Source; 2.4.2.2 EUV Optics; 2.4.2.3 EUV Mask; 2.4.2.4 EUV Resists; 2.4.3 X-Ray; 2.5 Optical Lithography at High NA. 
505 8 |a 2.6 Optical Lithography at Low k1 Factor2.6.1 Off-Axis Illumination (OAI); 2.6.2 Phase-Shifting Mask (PSM); 2.6.3 Optical Proximity Correction (OPC); 2.6.4 Photoresists; 2.6.4.1 Sensitivity; 2.6.4.2 Contrast; 2.6.4.3 Line Edge Roughness (LER); 2.6.4.4 Etch Resistance; 2.6.5 Design for€Manufacturing (DFM); 2.6.6 Double Processing; 2.7 Near-Field Optical Lithography; 2.8 Talbot Optical Lithography; 2.9 Interferometric Optical Lithography; 2.10 Maskless Optical Lithography; 2.11 Two-Photon Polymerization Lithography; References; Chapter 3: Nanofabrication by Electron Beam; 3.1 Introduction. 
505 8 |a 3.2 Principle of€Electron Optics3.2.1 Electron Lens; 3.2.2 Electron Source; 3.2.3 Aberrations; 3.3 Electron Beam Lithography Systems; 3.3.1 Basic Configuration; 3.3.2 Key Specifications; 3.3.3 Vector and€Raster Scanning; 3.3.4 Pattern Fragmentation; 3.3.5 Commercial e-Beam Lithography Systems; 3.4 Scattering and€Proximity Effect; 3.4.1 Electron Scattering; 3.4.2 Proximity Effect and€Correction; 3.4.3 Effect of€Secondary Electrons; 3.4.4 Low Energy e-Beam Lithography; 3.5 Resist Materials and€Processes; 3.5.1 Sensitivity of€Resist Materials; 3.5.2 Contrast of€Resist Materials. 
505 8 |a 3.5.3 Resolution Enhancement Processes3.6 Conditions for€High Resolution e-Beam Lithography; 3.7 High-Throughput e-Beam Lithography; 3.7.1 Shaped Beam Lithography; 3.7.2 Mask Projection Lithography; 3.7.3 Multi e-Beam Lithography; References; Chapter 4: Nanofabrication by Ion Beam; 4.1 Introduction; 4.2 Liquid Metal Ion Sources; 4.3 Focused Ion Beam Systems; 4.4 Ion Scattering in€Solid Materials; 4.5 FIB Direct Nanofabrication; 4.5.1 Ion Sputtering; 4.5.2 Ion Beam Assisted Deposition; 4.5.3 Applications; 4.5.3.1 Inspecting and€Editing Integrated Circuits. 
505 8 |a 4.5.3.2 Repairing Defects of€Optical Masks4.5.3.3 Preparing TEM Samples; 4.5.3.4 Nanostructuring for€Scientific Research; 4.6 Focused Ion Beam Lithography; 4.7 Ion Projection Lithography; References; Chapter 5: Nanofabrication by Scanning Probes; 5.1 Introduction; 5.2 Principles of€Scanning Probe Microscopes; 5.3 Exposure of€Resists; 5.3.1 Field Electron Emission; 5.3.2 Exposure of€Resist by STM; 5.3.3 Exposure of€Resist by NSOM; 5.4 Local Oxidation Lithography; 5.5 Additive Nanofabrication; 5.5.1 Field Induced Deposition; 5.5.2 Dip-Pen Nanolithography; 5.6 Subtractive Nanofabrication. 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty 
520 |a This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges. 
590 |a SpringerLink  |b Springer Complete eBooks 
650 0 |a Nanotechnology. 
650 0 |a Nanomanufacturing. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Erscheint auch als:  |n Druck-Ausgabe  |a Cui, Zheng. Nanofabrication .  |t Principles, Capabilities and Limits 
856 4 0 |u https://proxy.k.utb.cz/login?url=https://link.springer.com/10.1007/978-3-319-39361-2 
992 |c NTK-SpringerENG 
999 |c 99274  |d 99274 
993 |x NEPOSILAT  |y EIZ 

Similar Items