Resolution enhancement techniques in optical lithography

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Bibliographic Details
Main Author: Wong, Alfred Kwok-Kit.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Press, c2001.
Series: Tutorial texts in optical engineering ; v. TT 47.
Subjects:
Integrated circuits > Design and construction.
Microlithography.
elektronické knihy
electronic books
ISBN: 9781615837328
9780819478818
9780819439956
Physical Description: 1 online zdroj (xvii, 214 p.) : ill.

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020 |a 9781615837328  |q (ebook) 
020 |a 9780819478818  |q (ebook) 
020 |z 9780819439956 
024 7 |a 10.1117/3.401208  |2 doi 
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100 1 |a Wong, Alfred Kwok-Kit. 
245 1 0 |a Resolution enhancement techniques in optical lithography  |h [elektronický zdroj] /  |c Alfred Kwok-Kit Wong. 
260 |a Bellingham, Wash. :  |b SPIE Press,  |c c2001. 
300 |a 1 online zdroj (xvii, 214 p.) :  |b ill. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Tutorial texts in optical engineering ;  |v v. TT 47 
504 |a Includes bibliographical references (p. 189-208) and index. 
505 0 |a Foreword -- Preface-- List of symbols -- 1. Introduction. 1.1 Brief history of printing and lithography. 1.2 Optical lithography and integrated circuits. 1.3 Basics of optical lithography. 1.4 Requirements of microlithography. 1.5 Nonoptical microlithography techniques. 1.6 Current challenges of optical microlithography. 1.7 Three parameters affecting resolution. 1.8 Scope of discussion -- 2. Optical imaging and resolution. 2.1 Coherent imaging. 2.2 Mask spectrum. 2.3 Partially coherent imaging. 2.4 Complex degree of coherence. 2.5 Rayleigh's resolution limit. 2.6 Lithography resolution limit. 2.7 Quantification of image quality. -- 3. Modified illumination. 3.1 Partial coherence factor. 3.2 Off-axis illumination. 3.3 General guidelines -- 4. Optical proximity correction. 4.1 Image distortion. 4.2 Optical proximity correction approaches. 4.3 Numerical techniques. 4.4 Implementation. 4.5 Discussion -- 5. Alternating phase-shifting mask. 5.1 Principle. 5.2 Mask making process. 5.3 Issues. 5.4 Implementation. 5.5 Summary -- 6. Attenuated phase-shift mask. 6.1 Principle. 6.2 Mask making. 6.3 Discussion -- 7. Selecting appropriate RETs. 7.1 Critical levels. 7.2 Methodology. 7.3 Optimization results. 7.4 Summary and discussion -- 8 Second-Generation RETs. 8.1 Multiple exposure. 8.2 Pupil filtering. 8.3 Advanced illumination scheme. 8.4 Compensating process. 8.5 Mask and photoresist tone -- Concluding remarks -- k1 conversion charts -- Bibliography -- Index. 
520 |a Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers. 
590 |a Knovel Library  |b ACADEMIC - Optics & Photonics 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Integrated circuits  |x Design and construction. 
650 0 |a Microlithography. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Wong, Alfred Kwok-Kit.  |t Resolution enhancement techniques in optical lithography.  |d Bellingham, Wash. : SPIE Press, c2001  |z 0819439959  |w (DLC) 2001020028  |w (OCoLC)45879722 
830 0 |a Tutorial texts in optical engineering ;  |v v. TT 47. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpRETOL001/resolution_enhancement_techniques_in_optical_lithography  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 82195  |d 82195 
993 |x NEPOSILAT  |y EIZ 

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