Optical lithography here is why

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...

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Bibliographic Details
Main Author: Lin, Burn Jeng, 1942-
Corporate Author: SPIE (Society)
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE, 2010.
Series: SPIE monograph ; PM190.
Subjects:
Microlithography.
Semiconductors > Etching.
Lasers > Industrial applications.
elektronické knihy
electronic books
ISBN: 9780819481825
9781615837274
9780819475602
Physical Description: 1 online zdroj (xiv, 477 pages) : illustrations.

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Summary: This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Bibliography: Includes bibliographical references and index.
ISBN: 9780819481825
9781615837274
9780819475602
Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity

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