EUV sources for lithography

• Corporate Author: Society of Photo-optical Instrumentation Engineers.
• Other Authors: Bakshi, Vivek.
• Format: eBook
• Language: English
• Published: Bellingham, Wash. : SPIE, ©2006.
• Series: SPIE monograph ; PM149.
• Subjects: Ultraviolet radiation > Industrial applications.; Extreme ultraviolet lithography.; Plasma (Ionized gases); Lithography.; elektronické knihy; electronic books
• ISBN: 9780819480712; 9781615837168; 9780819458452
• Physical Description: 1 online zdroj (xxxv, 1057 pages) : illustrations.

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and...