Handbook of physical vapor deposition (PVD) processing film formation, adhesion, surface preparation and contamination control

Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processin...

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Bibliographic Details
Main Author Mattox, D. M.
Format Electronic eBook
LanguageEnglish
Published Westwood, N.J. : Noyes Publications, ©1998.
Subjects
Vapor-plating > Handbooks, manuals, etc.
elektronické knihy
electronic books
Online AccessFull text
ISBN9781591240792
9780815514220
Physical Description1 online zdroj (xxvii, 917 pages) : illustrations

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Table of Contents:
  • Introduction
  • Substrate (""Real"") Surfaces and Surface Modification
  • The Low-Pressure Gas and Vacuum Processing Environment
  • The Low-Pressure Plasma Processing Environment
  • Vacuum Evaporation and Vacuum Deposition
  • Physical Sputtering and Sputter Deposition (Sputtering)
  • Arc Vapor Deposition
  • Ion Plating and Ion Beam Assisted Deposition
  • Atomistic Film Growth and Some Growth-Related Film Properties
  • Film Characterization and Some Basic Film Properties
  • Addhesion and Deadhesion
  • Cleaning
  • External Processing Environment
  • APPENDIX 1: Reference Material
  • APPENDIX 2: Transfer of Technology from R & D to Manufacturing
  • Glossary of Terms and Acronyms Used in Surface Engineering.

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