Developments in surface contamination and cleaning. cleaning techniques Volume 8 :

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a who...

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Bibliographic Details
Other Authors: Kohli, Rajiv, (Editor), Mittal, K. L., (Editor)
Format: eBook
Language: English
Published: Oxford, England ; Waltham, Massachusetts : William Andrew, 2015.
Series: Developments in Surface Contamination and Cleaning Series ; Volume 8
Subjects:
ISBN: 9780323312714
9780323299619
Physical Description: 1 online zdroj (235 pages) : illustrations (some color).

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Table of contents

LEADER 03450cam a2200457 i 4500
001 79063
003 CZ ZlUTB
005 20240911214814.0
006 m o d
007 cr |n
008 141213t20152015enka sb 001 0 eng d
020 |a 9780323312714  |q (ebook) 
020 |z 9780323299619 
035 |a (OCoLC)899000515  |z (OCoLC)899273614 
040 |a E7B  |b eng  |e rda  |c E7B  |d OCLCO  |d OPELS  |d YDXCP 
245 0 0 |a Developments in surface contamination and cleaning.  |n Volume 8 :  |b cleaning techniques /  |c edited by Rajiv Kohli, K. L. Mittal. 
264 1 |a Oxford, England ;  |a Waltham, Massachusetts :  |b William Andrew,  |c 2015. 
264 4 |c ©2015 
300 |a 1 online zdroj (235 pages) :  |b illustrations (some color). 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 0 |a Developments in Surface Contamination and Cleaning Series ;  |v Volume 8 
504 |a Includes bibliographical references at the end of each chapters and index. 
520 |a As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Cleaning. 
650 0 |a Coatings. 
650 0 |a Particles  |x Measurement. 
650 0 |a Surface contamination  |x Prevention. 
650 0 |a Surfaces (Technology)  |x Inspection. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Kohli, Rajiv,  |e editor. 
700 1 |a Mittal, K. L.,  |e editor. 
776 0 8 |i Print version:  |t Developments in surface contamination and cleaning. Volume 8.  |d Oxford, England ; Waltham, Massachusetts : William Andrew, c2015  |h xvi, 218 pages  |k Developments in Surface Contamination and Cleaning Series ; Volume 8  |z 9780323299619 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpDSCCVCT1/developments_in_surface_contamination_and_cleaning_volume_8__cleaning_techniques  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 79063  |d 79063 
993 |x NEPOSILAT  |y EIZ