Advances in CMP/polishing technologies for the manufacture of electronic devices
Saved in:
| Other Authors | , , |
|---|---|
| Format | eBook |
| Language | English |
| Published |
Oxford :
Elsevier,
2012.
|
| Edition | 1st ed. |
| Subjects | |
| Online Access | Full text |
| ISBN | 9781437778601 9781437778595 |
| Physical Description | 1 online zdroj (xii, 317 p.) ill., col. ports. |
Cover
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| 245 | 0 | 0 | |a Advances in CMP/polishing technologies for the manufacture of electronic devices |h [elektronický zdroj] / |c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. |
| 250 | |a 1st ed. | ||
| 260 | |a Oxford : |b Elsevier, |c 2012. | ||
| 300 | |a 1 online zdroj (xii, 317 p.) |b ill., col. ports. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 520 | 3 | |a CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover. | |
| 590 | |a Knovel Library |b ACADEMIC - Electronics & Semiconductors | ||
| 506 | |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity | ||
| 650 | 0 | |a Grinding and polishing. | |
| 655 | 7 | |a elektronické knihy |7 fd186907 |2 czenas | |
| 655 | 9 | |a electronic books |2 eczenas | |
| 700 | 1 | |a Doi, Toshiro K., |d 1947- | |
| 700 | 1 | |a Marinescu, Ioan D. | |
| 700 | 1 | |a Kurokawa, Syuhei. | |
| 776 | 0 | 8 | |i Print version: |t Advances in CMP/polishing technologies for the manufacture of electronic devices. |b 1st ed. |d Oxford ; Waltham, MA : Elsevier, 2012 |z 9781437778595 |w (DLC) 2012359712 |w (OCoLC)740631119 |
| 856 | 4 | 0 | |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpACMPPTM3/advances_in_cmppolishing_technologies_for_the_manufacture_of_electronic_devices |
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