Physics of radio-frequency plasmas

"Low-temperature radio-frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on phy...

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Bibliographic Details
Main Author Chabert, Pascal, 1969-
Other Authors Braithwaite, Nicholas
Format eBook
LanguageEnglish
Published Cambridge ; New York : Cambridge University Press, 2011.
Subjects
Online AccessFull text
ISBN9780511861017
9780511974342
9780511856662
9780521763004
Physical Description1 online zdroj (viii, 385 p.) : ill.

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100 1 |a Chabert, Pascal,  |d 1969- 
245 1 0 |a Physics of radio-frequency plasmas  |h [elektronický zdroj] /  |c Pascal Chabert, Nicholas Braithwaite. 
260 |a Cambridge ;  |a New York :  |b Cambridge University Press,  |c 2011. 
300 |a 1 online zdroj (viii, 385 p.) :  |b ill. 
520 |a "Low-temperature radio-frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics, including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations"--  |c Provided by publisher. 
504 |a Includes bibliographical references (p. 375-382) and index. 
505 8 |a Machine generated contents note: 1. Introduction; 2. Plasma dynamics and equilibrium; 3. Bounded plasmas; 4. Radiofrequency sheaths; 5. Single frequency capacitively-coupled plasmas; 6. Multi-frequency capacitively-coupled plasmas; 7. Inductively-coupled plasmas; 8. Helicon plasmas; 9. Real plasmas; 10. Electrical measurements; Index. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
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650 0 |a Low temperature plasmas. 
650 0 |a Radio frequency. 
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700 1 |a Braithwaite, Nicholas  |q (Nicholas St. J.) 
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