Lithography process control

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...

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Bibliographic Details
Main Author: Levinson, Harry J.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, c1999.
Series: Tutorial texts in optical engineering ; v. TT 28.
Subjects:
Semiconductors > Etching.
Microlithography > Quality control.
elektronické knihy
electronic books
ISBN: 9781615837366
9780819478559
9780819430526
Physical Description: 1 online zdroj (x, 190 p.) : ill.

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Table of contents

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020 |a 9781615837366  |q (ebook) 
020 |a 9780819478559  |q (ebook) 
020 |z 9780819430526 
024 7 |a 10.1117/3.322162  |2 doi 
035 |a (OCoLC)697188897  |z (OCoLC)435970881  |z (OCoLC)508394749 
040 |a KNOVL  |b eng  |c KNOVL  |d CEF  |d OCLCQ  |d DEBSZ  |d GA0  |d OCLCQ  |d KNOVL  |d ZCU  |d KNOVL  |d OCLCF  |d J2I  |d SPIES  |d EBLCP  |d E7B  |d OCLCO  |d N$T  |d KNOVL  |d YDXCP 
100 1 |a Levinson, Harry J. 
245 1 0 |a Lithography process control  |h [elektronický zdroj] /  |c Harry J. Levinson. 
260 |a Bellingham, Wash. :  |b SPIE Optical Engineering Press,  |c c1999. 
300 |a 1 online zdroj (x, 190 p.) :  |b ill. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Tutorial texts in optical engineering ;  |v v. TT 28 
504 |a Includes bibliographical references (p. 169-188) and index. 
505 0 0 |g ch. 1.  |t Introduction to the use of statistical process control in lithography --  |g ch. 2.  |t Sampling --  |g ch. 3.  |t Simple and complex processes --  |g ch. 4.  |t Linewidth control --  |g ch. 5.  |t Overlay --  |g ch. 6.  |t Yield --  |g ch. 7.  |t Process drift and automatic process control --  |g ch. 8.  |t Metrology --  |g ch. 9.  |t Control of operations. 
505 0 |a 1. Introduction to the use of statistical process control in lithography -- The assumptions underlying statistical process control -- The properties of statistical process control -- Situations in lithography where statistical process control cannot be applied naively -- Non-normal distributions -- Process capability -- 2. Sampling -- Choosing the proper sample size -- Measurement location considerations -- Correlations -- Measurement frequency -- Systematic sources of variation -- 3. Simple and complex processes -- Definitions -- Why test wafers are useful -- How to address complex processes in lithography -- Distinguishing between layer-specific and equipment-specific effects -- 4. Linewidth control -- Cause and effect -- Independent variables -- Exposure dose -- Resist thickness -- Focus -- Bake temperatures -- Resist development -- Humidity -- DUV resists--special considerations -- Contributions from reticles -- Maximizing the process window -- 5. Overlay -- Overlay models -- Matching -- Contributions from processing and alignment mark optimization -- Addressing the problem of non-normal distributions -- Outliers -- 6. Yield -- Yield monitor strategy -- Yield models -- Parameters which affect yield -- 7. Process drift and automatic process control -- Adjusting for process drift -- The exponentially-weighted moving average -- Automatic process control -- 8. Metrology -- The need for understanding the measurement process: defect detection -- Linewidth measurement using scanning electron microscopes -- Electrical linewidth measurement -- Measurement error budgets -- Measurement of overlay -- 9. Control of operations -- Self-control -- Documentation -- ISO 9000. 
520 |a This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Semiconductors  |x Etching. 
650 0 |a Microlithography  |x Quality control. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
776 0 8 |i Print version:  |a Levinson, Harry J.  |t Lithography process control.  |d Bellingham, Wash. : SPIE Optical Engineering Press, c1999  |z 0819430528  |w (DLC) 98044433  |w (OCoLC)39875237 
830 0 |a Tutorial texts in optical engineering ;  |v v. TT 28. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpLPC0000E/lithography_process_control  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 78977  |d 78977 
993 |x NEPOSILAT  |y EIZ 

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