Lithography process control

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...

Full description

Saved in:
Bibliographic Details
Main Author: Levinson, Harry J.
Format: eBook
Language: English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, c1999.
Series: Tutorial texts in optical engineering ; v. TT 28.
Subjects:
Semiconductors > Etching.
Microlithography > Quality control.
elektronické knihy
electronic books
ISBN: 9781615837366
9780819478559
9780819430526
Physical Description: 1 online zdroj (x, 190 p.) : ill.

Cover

Table of contents

Description
Summary: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Bibliography: Includes bibliographical references (p. 169-188) and index.
ISBN: 9781615837366
9780819478559
9780819430526
Access: Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity

Similar Items