|
|
|
|
| LEADER |
00000cam a2200000 4500 |
| 001 |
78927 |
| 003 |
CZ-ZlUTB |
| 005 |
20251006170704.0 |
| 006 |
m o d |
| 007 |
cr |n |
| 008 |
900109e19891231maua s 000 0 eng d |
| 020 |
|
|
|a 9780815511991
|
| 035 |
|
|
|a (OCoLC)468755069
|
| 040 |
|
|
|a COO
|b eng
|c COO
|d UBY
|d OCLCQ
|d OCLCF
|d OCLCO
|
| 100 |
1 |
|
|a Cuomo, Jerome J.,
|e Author
|e Editor.
|4 edt
|
| 245 |
1 |
0 |
|a Handbook of Ion Beam Processing Technology
|h [elektronický zdroj]:
|b Principles, Deposition, Film Modification and Synthesis.
|
| 260 |
|
|
|b Noyes Publications [Imprint]
|c Dec. 1989
|a Burlington :
|b William Andrew, Inc.
|a Saint Louis :
|b Elsevier Science & Technology Books [distributor]
|
| 300 |
|
|
|a 1 online zdroj (456 p.)
|b ill.
|
| 521 |
|
|
|a Scholarly & Professional
|b William Andrew, Incorporated.
|
| 504 |
|
|
|a Includes bibliographies and index.
|
| 590 |
|
|
|a Knovel Library
|b ACADEMIC - Electronics & Semiconductors
|
| 506 |
|
|
|a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity
|
| 650 |
|
0 |
|a Ion implantation.
|
| 650 |
|
0 |
|a Ion bombardment
|x Industrial applications.
|
| 655 |
|
7 |
|a elektronické knihy
|7 fd186907
|2 czenas
|
| 655 |
|
9 |
|a electronic books
|2 eczenas
|
| 700 |
1 |
|
|a Rossnagel, Stephen M.,
|e Editor.
|4 edt
|
| 700 |
1 |
|
|a Kaufman, Harold R.,
|e Author
|e Editor.
|4 edt
|
| 700 |
1 |
|
|a Haber, Stephen M.,
|e Author
|e Editor.
|4 edt
|
| 856 |
4 |
0 |
|u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpHIBPTPD3/handbook_of_ion_beam_processing_technology__principles_deposition_film_modification_and_synthesis
|
| 992 |
|
|
|a BK
|c KNOVEL
|
| 999 |
|
|
|c 78927
|d 78927
|
| 993 |
|
|
|x NEPOSILAT
|y EIZ
|
