Thin film processes II

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to t...

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Bibliographic Details
Other Authors: Vossen, John L., Kern, Werner, 1925-
Format: eBook
Language: English
Published: Boston : Academic Press, c1991.
Series: Thin film processes ; 2
Subjects:
Thin films.
elektronické knihy
electronic books
ISBN: 9780080524214
9781601192905
9780127282510
Physical Description: 1 online zdroj (xiii, 866 p.) : ill.

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020 |z 9780080524214 
020 |a 9781601192905  |q (ebook) 
020 |z 9780127282510 
035 |a (OCoLC)144646036  |z (OCoLC)468758959 
040 |a KNOVL  |b eng  |c KNOVL  |d TEF  |d OCLCQ  |d OPELS  |d N$T  |d IDEBK  |d E7B  |d KNOVL  |d ZCU  |d COO  |d KNOVL  |d OCLCF  |d UIU  |d KNOVL  |d YDXCP 
245 0 0 |a Thin film processes II  |h [elektronický zdroj] /  |c edited by John L. Vossen, Werner Kern. 
246 3 |a Thin film processes two 
260 |a Boston :  |b Academic Press,  |c c1991. 
300 |a 1 online zdroj (xiii, 866 p.) :  |b ill. 
490 0 |a Thin film processes ;  |v 2 
504 |a Includes bibliographical references and index. 
505 0 |a Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel -- Evaporation processes / Chandra Deshpandey and Rointan Bunshah -- Molecular beam epitaxy / Peter P. Chow -- Sputter deposition processes / Robert Parsons -- The cathodic arc plasma deposition of thin films / Philip C. Johnson -- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern -- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen -- Photochemical vapor deposition / J. Gary Eden -- Sol-gel coatings / Lisa C. Klein -- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern -- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky ... [et al.] -- Selected area processing / Thomas M. Mayer and Susan D. Allen -- Plasma-assisted etching / Hans W. Lehmann. 
505 0 |a Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes -- Laser-driven etching / Carol I.H. Ashby. 
520 |a This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Thin films. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Vossen, John L. 
700 1 |a Kern, Werner,  |d 1925- 
776 0 8 |i Print version:  |t Thin film processes II.  |d Boston : Academic Press, c1991  |z 0127282513  |w (DLC) 90020758  |w (OCoLC)22623928 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpTFPII00G/thin_film_processes_ii  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 78884  |d 78884 
993 |x NEPOSILAT  |y EIZ 

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